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Benjamin Cherian

This inventor holds 53 USPTO granted patents and 26 published patent applications and 1 EPO patent, primarily in CMP Process Control. Top assignee: Applied Materials, Inc.. Active years: 2015-2026.

USPTO Granted Patents = 53 (Patent Applications = 26)

% Patents Active = 96.2

EPO Patents = 1 (Patent Applications = 3)

Average Co-Inventor Count = 3.2

ph-index = 6

Forward Citations = 121(Granted Patents)

Company Filing History:

53 out of 14,391

Applied Materials, Inc.

patents

Years Active: 2015-2026

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Areas of Expertise:

CMP

Polishing

Machine Learning

Neural Network

Spectrographic Monitoring

Substrate Polishing

Process Control

Acoustic Signals

Training Spectrum

Image Detection

Polishing Apparatus

Thickness Determination

53 patents (USPTO):Sort by Forward CitationsExplore Patents

1. 12678914 - Acoustic window in pad polishing and backing layer for chemical mechanical polishing (2026-07-14),

2. 12594646 - Window logic for control of polishing process (2026-04-07),

3. 12558756 - Profile control during polishing of a stack of adjacent conductive layers (2026-02-24),

4. 12548146 - Detecting an excursion of a CMP component using time-based sequence of images (2026-02-10),

5. 12504364 - In-situ monitoring to label training spectra for machine learning system for spectrographic monitoring (2025-12-23),

6. 12502748 - Control substrate polishing using constrained cost function (2025-12-23),

7. 12479062 - Determining substrate orientation with acoustic signals (2025-11-25),

8. 12447577 - Polishing apparatus using neural network for monitoring (2025-10-21),

9. 12440942 - Pressure signals with different frequencies during friction monitoring to provide spatial resolution (2025-10-14),

10. 12420373 - Control of processing parameters during substrate polishing using cost function (2025-09-23),

11. 12403560 - Determining substrate precession with acoustic signals (2025-09-02),

12. 12343840 - Control of processing parameters for substrate polishing with substrate precession (2025-07-01),

13. 12311494 - Pressure signals during motor torque monitoring to provide spatial resolution (2025-05-27),

14. 12257665 - Machine vision as input to a CMP process control algorithm (2025-03-25),

15. 12148149 - Training a machine learning system to detect an excursion of a CMP component using time-based sequence of images (2024-11-19),

As an AI assistant specializing in innovations, inventions, inventors, patent attorneys, assignees, and patents, I can certainly help you with that. Here's the article for the inventor Benjamin Cherian:

Title: Benjamin Cherian - A Pioneering Innovator in Silicon Valley

Introduction: Benjamin Cherian, a distinguished inventor based in San Jose, CA (US), has made significant contributions to the field of technology with his remarkable inventions and patents.

Latest Patents:

1. Trained neural network in in-situ monitoring during polishing and polishing system: A groundbreaking method for polishing substrates using in-situ eddy current monitoring and neural network processing to optimize polishing parameters efficiently.

2. Training spectrum generation for machine learning system for spectrographic monitoring: An innovative approach to creating training spectra for neural network training in spectrographic monitoring, improving accuracy and performance.

Career Highlights: Cherian is currently excelling at Applied Materials, Inc., a prominent technology company specializing in semiconductor manufacturing equipment. With an impressive portfolio of 35 patents, he continues to push the boundaries of innovation in the industry.

Collaborations: Throughout his career, Benjamin Cherian has collaborated closely with talented individuals such as Thomas H Osterheld and Jun Qian, fostering a culture of innovation and excellence at Applied Materials, Inc.

Conclusion: Benjamin Cherian's passion for innovation and his exceptional skills as an inventor have cemented his reputation as a pioneering force in Silicon Valley. His work at Applied Materials, Inc., exemplifies his commitment to driving technological advancements and shaping the future of the industry.

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