The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 14, 2025

Filed:

Feb. 22, 2022
Applicant:

Applied Materials, Inc., Santa Clara, CA (US);

Inventors:

Thomas Li, Santa Clara, CA (US);

Benjamin Cherian, San Jose, CA (US);

Assignee:

Applied Materials, Inc., Santa Clara, CA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B24B 37/013 (2012.01); B24B 37/04 (2012.01); H01L 21/66 (2006.01);
U.S. Cl.
CPC ...
B24B 37/013 (2013.01); B24B 37/042 (2013.01); H01L 22/26 (2013.01);
Abstract

A method of polishing includes holding a substrate with a carrier head against a polishing surface of a polishing pad, generating relative motion between the substrate and polishing pad, applying a first pressure in a first cyclic waveform having a first frequency to a first region of the substrate, applying a second pressure in a second cyclic waveform having a different second frequency to a different second region of the substrate, during polishing of the substrate, monitoring the substrate with an in-situ motor torque monitoring system to generate a sequence of measured values, and determining a relative contribution to the sequence of measured values from the first region and second region based on distinguishing the first frequency from the second frequency.


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