Benjamin C Wang

Title: Innovations by Benjamin C Wang

Introduction

Benjamin C Wang is a notable inventor based in Santa Clara, CA. He has made significant contributions to the field of materials science, particularly in the development of advanced deposition methods. With a total of 4 patents to his name, Wang continues to push the boundaries of innovation in his industry.

Latest Patents

Wang's latest patents include groundbreaking methods for depositing titanium oxide films. One of his patents focuses on deposition methods for uniform and conformal hybrid titanium oxide films. This patent discloses techniques for depositing titanium oxide films by atomic layer deposition, which may include a titanium nitride cap or a mixed oxide nitride layer. Additionally, he has developed methods for self-aligned double patterning that utilize titanium oxide spacer films. Another significant patent addresses plasma treatment of films for impurity removal. This method involves positioning a substrate with a barrier layer in a processing chamber and using plasma treatment to reduce impurities in the barrier layer, enhancing the overall quality of the films.

Career Highlights

Wang is currently employed at Applied Materials, Inc., where he applies his expertise in materials science to develop innovative solutions. His work has been instrumental in advancing the technology used in semiconductor manufacturing and other related fields.

Collaborations

Wang has collaborated with talented individuals such as Kai Wu and Joshua Collins, contributing to a dynamic work environment that fosters innovation and creativity.

Conclusion

Benjamin C Wang is a prominent inventor whose work in deposition methods and plasma treatment has made a significant impact in the field of materials science. His contributions continue to shape the future of technology and innovation.