Santa Clara, CA, United States of America

Barney M Cohen


Average Co-Inventor Count = 3.5

ph-index = 10

Forward Citations = 411(Granted Patents)


Location History:

  • San Jose, CA (US) (1997)
  • Santa Clara, CA (US) (1997 - 2006)

Company Filing History:


Years Active: 1997-2006

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12 patents (USPTO):Explore Patents

Title: Barney M. Cohen: Innovator in Plasma Processing Technology

Introduction: Barney M. Cohen is a prominent inventor based in Santa Clara, CA, with an impressive portfolio of 12 patents. His innovative work primarily focuses on plasma processing technologies that enhance substrate cleaning and metal deposition in semiconductor manufacturing.

Latest Patents: Cohen's latest inventions include groundbreaking patents that optimize plasma precleaning processes. The first, titled "Plasma preclean with argon, helium, and hydrogen gases," introduces a method and apparatus for precleaning patterned substrates using a specific gas mixture. The inclusion of helium alongside argon and hydrogen significantly increases the etch rate, especially when argon concentrations are maintained below 75% by volume. This invention allows for meticulous control of etch properties through the use of RF power coupled capacitively and inductively.

Another noteworthy patent, "Sequential sputter and reactive precleans of vias and contacts," outlines a method that improves both fill and electrical performance of metals deposited on patterned dielectric layers. This invention details a systematic treatment of apertures like vias and trenches, enhancing their cleaning process to reduce metal oxides. The innovation showcases a two-step plasma treatment using argon followed by hydrogen and helium, maximizing the efficiency of metal barrier layers before deposition.

Career Highlights: Cohen's career is marked by his association with Applied Materials, Inc., a leading company in semiconductor equipment and services. His contributions to the field have been pivotal in advancing cleanroom technologies and optimizing metal deposition processes, which are critical in semiconductor manufacturing.

Collaborations: Throughout his career, Cohen has collaborated with talented professionals, including Kenny King-Tai Ngan and Suraj Rengarajan. These partnerships have fostered an environment of innovation, leading to the development of advanced technologies and methodologies in plasma processing.

Conclusion: Barney M. Cohen stands out as a significant contributor to the field of plasma technology in semiconductor manufacturing. His inventions not only advance the capabilities of precleaning and metal deposition processes but also showcase the importance of innovation in driving the industry forward. His work continues to inspire future advancements in semiconductor technology and manufacturing practices.

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