The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 18, 1997
Filed:
Mar. 08, 1995
Applied Materials, Inc., Santa Clara, CA (US);
Abstract
A pedestal for supporting a semiconductor substrate in an R.F. plasma reactor chamber includes a conductive disk platen having a diameter exceeding the diameter of the substrate so that an outer annular portion of the conductive disk platen provides a direct path of R.F. power from the plasma while a remaining inner portion of the conductive disk provides a path of R.F. power from the plasma through the substrate, an etch-resistant cover shielding the conductive platen from the plasma, a portion of the etch-resistant layer underlying the substrate, the etch-resistant cover including a raised disk overlying a central portion of the conductive disk platen and underlying the substrate and having a diameter less than the diameter of the substrate so that a peripheral portion of the substrate extends beyond the circumference of the raised disk, a recessed ring annulus overlying an outer portion of the conductive disk platen and having a top surface which is depressed below a top surface of the raised disk, an inner portion of the recessed ring annulus underlying the peripheral portion of the substrate, leaving a top portion of a side wall of the raised disk exposed to the plasma.