Company Filing History:
Years Active: 2005-2008
Title: Baiei Kawano: Innovator in Thin Film Technology
Introduction
Baiei Kawano is a prominent inventor based in Tama, Japan. He has made significant contributions to the field of thin film technology, holding a total of 5 patents. His work focuses on developing advanced apparatuses and methods that enhance the efficiency and effectiveness of thin film formation processes.
Latest Patents
Kawano's latest patents include an "Apparatus and method for forming thin film using upstream and downstream exhaust mechanisms." This innovative thin-film formation apparatus features a reaction chamber designed to be evacuated, a placing portion for substrates, and a gas-dispersion guide that supplies gas onto the substrate surface. The apparatus also includes a gas-supply port, a gas-dispersion plate with multiple gas-discharge pores, and two exhaust ports for efficient gas management.
Another notable patent is the "Dual-chamber plasma processing apparatus." This apparatus consists of two reaction spaces, each equipped with different gas inlet lines and RF systems. Each space is designed to supply and return RF power, enhancing the versatility and performance of plasma processing.
Career Highlights
Baiei Kawano is currently associated with Asm Japan K.K., where he continues to innovate in the field of thin film technology. His expertise and dedication have positioned him as a key figure in the development of advanced manufacturing processes.
Collaborations
Kawano has collaborated with notable colleagues, including Akira Shimizu and Hideaki Fukuda. Their combined efforts have contributed to the advancement of technologies in their field.
Conclusion
Baiei Kawano's contributions to thin film technology through his patents and collaborations highlight his role as an influential inventor. His work continues to impact the industry positively, paving the way for future innovations.