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For the Inventor, By the Inventor

Fishkill, NY, United States of America

Ayman Hamouda

USPTO Granted Patents = 11

Average Co-Inventor Count = 1.2

ph-index = 4

Forward Citations = 38(Granted Patents)


Location History:

  • Fishkill, NY (US) (2014 - 2019)
  • Hopewell Junction, NY (US) (2019)
  • Milpitas, CA (US) (2020)

Company Filing History:

goldMedal10 out of 5,671 
 
Globalfoundries Inc.
 patents
silverMedal1 out of 1 
 
Blobalfoundries Inc.
 patent

Years Active: 2014-2020

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11 patents (USPTO):Explore Patents
1. 10831977 - Curvilinear mask models (2020-11-10),
2. 10345694 - Model-based generation of dummy features (2019-07-09),
3. 10262099 - Methodology for model-based self-aligned via awareness in optical proximity correction (2019-04-16),
4. 9747401 - Methods for modifying an integrated circuit layout design (2017-08-29),
5. 9740092 - Model-based generation of dummy features (2017-08-22),
6. 9672311 - Method and system for via retargeting (2017-06-06),
7. 9443055 - Methods for retargeting circuit design layouts and for fabricating semiconductor devices using retargeted layouts (2016-09-13),
8. 9378323 - Methods for retargeting vias and for fabricating semiconductor devices with retargeted vias (2016-06-28),
9. 9317645 - Methods for modifying an integrated circuit layout design (2016-04-19),
10. 8997027 - Methods for modifying an integrated circuit layout design (2015-03-31),
11. 8881069 - Process enhancing safe SRAF printing using etch aware print avoidance (2014-11-04),

Title: Ayman Hamouda: Innovator in Semiconductor Technology

Introduction

Ayman Hamouda is a prominent inventor based in Fishkill, NY (US), known for his significant contributions to semiconductor technology. With a total of 11 patents to his name, he has made remarkable advancements in the field, particularly in the area of silicon photonics applications.

Latest Patents

Hamouda's latest patents include innovative methods for curvilinear mask models. This patent focuses on semiconductor structures and outlines a method that involves calibrating machine learning models for silicon photonics applications. The process includes retargeting designs in a layout by applying these machine learning models and repairing unmatching shapes to generate final curvilinear mask shapes. Another notable patent is the model-based generation of dummy features, which enhances target design printability during photolithography. This approach involves generating dummy features in proximity to target features and optimizing their layout to improve the semiconductor device's processing.

Career Highlights

Throughout his career, Ayman Hamouda has worked with leading companies in the semiconductor industry, including GlobalFoundries Inc. His expertise and innovative mindset have allowed him to contribute significantly to the development of advanced semiconductor technologies.

Collaborations

Hamouda has collaborated with talented individuals in the field, including Mohab Anis and Mohamed Elsayed Mohamed Lotfy Gheith. These collaborations have further enriched his work and contributed to the success of his projects.

Conclusion

Ayman Hamouda's contributions to semiconductor technology through his patents and collaborations highlight his role as an influential inventor in the industry. His innovative approaches continue to shape the future of silicon photonics applications and semiconductor processing.

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