The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 10, 2020

Filed:

Jun. 03, 2019
Applicant:

Globalfoundries Inc., Grand Cayman, KY;

Inventors:

Mohamed Elsayed Mohamed Lotfy Gheith, Gansevoort, NY (US);

Ian Stobert, Hopewell Junction, NY (US);

Ayman Hamouda, Milpitas, CA (US);

Assignee:

GLOBALFOUNDRIES INC., Grand Cayman, KY;

Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
G06F 30/398 (2020.01); G03F 1/70 (2012.01); G06N 20/00 (2019.01); G06F 119/18 (2020.01);
U.S. Cl.
CPC ...
G06F 30/398 (2020.01); G03F 1/70 (2013.01); G06N 20/00 (2019.01); G06F 2119/18 (2020.01);
Abstract

The present disclosure generally relates to semiconductor structures and, more particularly, to curvilinear mask models and methods of manufacture. The method includes: calibrating, by a computing device, machine learning models for silicon photonics applications; retargeting, by the computing device, designs in a layout for the silicon photonics applications by applying the machine learning models to the designs; and repairing, by the computing device, unmatching shapes in the retargeted designs to generate final curvilinear mask shapes for the silicon photonics application.


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