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For the Inventor, By the Inventor

Rochester, MN, United States of America

Axel Aguado Granados

This inventor holds 13 USPTO granted patents and 1 EPO patent. Top assignee: International Business Machines Corporation. Active years: 2009-2013.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Axel Aguado Granados. Retrieved from https://idiyas.com/inventor/axel-aguado-granados

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank
USPTO Granted Patents = 13

 

Average Co-Inventor Count = 5.3

ph-index = 3

Forward Citations = 23(Granted Patents)


Company Filing History:

goldMedal13 out of 166,425 
 
International Business Machines Corporation
 patents

Years Active: 2009-2013

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13 patents (USPTO):Explore Patents
1. 8536587 - Method and apparatus for measurement and control of photomask to substrate alignment (2013-09-17),
2. 8535393 - Method and apparatus for measurement and control of photomask to substrate alignment (2013-09-17),
3. 8385554 - Preventing execution of pirated software (2013-02-26),
4. 8138089 - Method and apparatus for measurement and control of photomask to substrate alignment (2012-03-20),
5. 8108820 - Enhanced conductivity in an airgapped integrated circuit (2012-01-31),
6. 8003412 - Method and apparatus for measurement and control of photomask to substrate alignment (2011-08-23),
7. 7992001 - Preventing execution of software without a dynamically generated key (2011-08-02),
8. 7989968 - Method and apparatus for measurement and control of photomask to substrate alignment (2011-08-02),
9. 7989337 - Implementing vertical airgap structures between chip metal layers (2011-08-02),
10. 7979824 - Cost-benefit optimization for an airgapped integrated circuit (2011-07-12),
11. 7935546 - Method and apparatus for measurement and control of photomask to substrate alignment (2011-05-03),
12. 7875987 - Method and apparatus for measurement and control of photomask to substrate alignment (2011-01-25),
13. 7532037 - Enhanced CML driver circuit for 'quiet-driver' measurement enablement (2009-05-12),

Title: The Innovations of Axel Aguado Granados

Introduction

Axel Aguado Granados is a prominent inventor based in Rochester, MN (US). He has made significant contributions to the field of technology, particularly in the area of photomask alignment. With a total of 13 patents to his name, Granados has established himself as a key figure in innovation.

Latest Patents

One of his latest patents is a method and apparatus for measurement and control of photomask to substrate alignment. This innovative method involves directing incident light through a pattern of clear regions that are transparent to the incident light in an opaque-to-the-incident-light region of a photomask. The light passes through a lens and onto a photodiode formed in a substrate. The photodiodes are electrically connected to a light-emitting diode formed in the substrate, which emits light of a different wavelength than that of the incident light. The process includes measuring the intensity of emitted light from the light-emitting diode and adjusting the alignment of the photomask to the substrate based on the measured intensity.

Career Highlights

Granados is currently employed at International Business Machines Corporation, commonly known as IBM. His work at IBM has allowed him to further develop his innovative ideas and contribute to cutting-edge technology.

Collaborations

Throughout his career, Granados has collaborated with notable coworkers such as Benjamin A Fox and Nathaniel James Gibbs. These collaborations have likely enriched his work and led to further advancements in his field.

Conclusion

Axel Aguado Granados is a distinguished inventor whose work in photomask alignment has made a significant impact in technology. His numerous patents and contributions to IBM highlight his dedication to innovation and excellence in his field.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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