The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 20, 2012
Filed:
Jul. 06, 2011
Axel A. Granados, Rochester, MN (US);
Benjamin A. Fox, Rochester, MN (US);
Nathaniel J. Gibbs, Rochester, MN (US);
Andrew B. Maki, Rochester, MN (US);
Trevor J. Timpane, Rochester, MN (US);
Axel A. Granados, Rochester, MN (US);
Benjamin A. Fox, Rochester, MN (US);
Nathaniel J. Gibbs, Rochester, MN (US);
Andrew B. Maki, Rochester, MN (US);
Trevor J. Timpane, Rochester, MN (US);
International Business Machines Corporation, Armonk, NY (US);
Abstract
A method, structure, system of aligning a substrate to a photomask. The method comprising: directing light through a clear region of the photomask in a photolithography tool, through a lens of the tool and onto a set of at least three diffraction minor arrays on the substrate, each diffraction minor array of the set of at least three diffraction minor arrays comprising a single row of minors, all mirrors in any particular diffraction minor array spaced apart a same distance, minors in different diffraction minor arrays spaced apart different distances; measuring an intensity of light diffracted from the set of at least three diffraction mirror arrays onto an array of photo detectors; and adjusting a temperature of the photomask or photomask and lens based on the measured intensity of light.