The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 17, 2013
Filed:
Jan. 03, 2011
Axel Aguado Granados, Rochester, MN (US);
Benjamin Aaron Fox, Rochester, MN (US);
Nathaniel James Gibbs, Rochester, MN (US);
Andrew Benson Maki, Rochester, MN (US);
John Edward Sheets, Ii, Zumbrota, MN (US);
Trevor Joseph Timpane, Rochester, MN (US);
Axel Aguado Granados, Rochester, MN (US);
Benjamin Aaron Fox, Rochester, MN (US);
Nathaniel James Gibbs, Rochester, MN (US);
Andrew Benson Maki, Rochester, MN (US);
John Edward Sheets, II, Zumbrota, MN (US);
Trevor Joseph Timpane, Rochester, MN (US);
International Business Machines Corporation, Armonk, NY (US);
Abstract
A method, structure, system of aligning a substrate to a photomask. The method includes: directing incident light through a pattern of clear regions transparent to the incident light in an opaque-to-the-incident-light region of a photomask, through a lens and onto a photodiode formed in a substrate, the photodiodes electrically connected to a light emitting diode formed in the substrate, the light emitting diode emitting light of different wavelength than a wavelength of the incident lights; measuring an intensity of emitted light from light emitting diode; and adjusting alignment of the photomask to the substrate based on the measured intensity of emitted light.