Company Filing History:
Years Active: 2014-2020
Title: Innovations of Atsutoshi Arakawa in Magnetic Material Sputtering Targets
Introduction
Atsutoshi Arakawa is a prominent inventor based in Ibaraki, Japan. He has made significant contributions to the field of magnetic materials, particularly in the development of sputtering targets. With a total of 10 patents to his name, Arakawa's work has had a substantial impact on the production of thin films used in various applications.
Latest Patents
One of Arakawa's latest patents is focused on a magnetic material sputtering target and the method for producing it. This invention involves a target produced from a sintered compact that contains a boron (B) content of 17 at % or more and 40 at % or less, with the remainder being one or more elements selected from cobalt (Co) and iron (Fe). The target includes both a B-rich phase and a B-poor phase, with a maximum inscribed circle diameter of 15 μm or more being limited to one or less. This finely dispersed B-rich phase enhances the machinability of the target, leading to improved yield in thin film production when used with magnetron sputtering equipment. Another patent by Arakawa describes a magnetic material sputtering target formed from a sintered body containing at least Co and/or Fe and B, with B in an amount of 10 to 50 at % and an oxygen content of 100 wtppm or less. This innovation effectively suppresses particle generation caused by oxides, thereby improving the yield in producing magnetoresistive films.
Career Highlights
Atsutoshi Arakawa is currently employed at JX Nippon Mining & Metals Corporation, where he continues to innovate in the field of magnetic materials. His expertise and dedication to research have positioned him as a key figure in the development of advanced sputtering targets.
Collaborations
Arakawa has collaborated with notable colleagues, including Atsushi Sato and Yuichiro Nakamura, to further enhance the research and development of magnetic materials.
Conclusion
Atsutoshi Arakawa's contributions to the field of magnetic material sputtering targets demonstrate his innovative spirit and commitment to advancing technology. His patents reflect a deep understanding of material science and its applications in modern manufacturing.