The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 05, 2020
Filed:
Feb. 24, 2016
Applicant:
Jx Nippon Mining & Metals Corporation, Tokyo, JP;
Inventor:
Atsutoshi Arakawa, Ibaraki, JP;
Assignee:
JX NIPPON MINING & METALS CORPORATION, Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C22C 19/07 (2006.01); C22C 38/00 (2006.01); C23C 14/34 (2006.01); C23C 14/06 (2006.01); H01L 43/12 (2006.01); H01F 41/18 (2006.01); H01F 1/147 (2006.01); H01L 27/105 (2006.01); H01L 43/08 (2006.01); H01L 43/10 (2006.01); H01F 1/22 (2006.01); H01F 10/14 (2006.01);
U.S. Cl.
CPC ...
H01L 43/12 (2013.01); C22C 19/07 (2013.01); C22C 38/00 (2013.01); C23C 14/067 (2013.01); C23C 14/3414 (2013.01); H01F 1/22 (2013.01); H01F 41/183 (2013.01); H01L 27/105 (2013.01); H01L 43/08 (2013.01); H01L 43/10 (2013.01); H01F 1/147 (2013.01); H01F 10/14 (2013.01);
Abstract
A magnetic material sputtering target formed from a sintered body containing at least Co and/or Fe and B, and containing B in an amount of 10 to 50 at %, wherein an oxygen content is 100 wtppm or less. Since the magnetic material sputtering target of the present invention can suppress the generation of particles caused by oxides, the present invention yields superior effects of being able to improve the yield upon producing magnetoresistive films and the like.