Joetsu, Japan

Atsushi Yoshida

This inventor holds 8 USPTO granted patents and 4 published patent applications and 5 EPO patents. Top assignee: Shin-Etsu Chemical Co., Ltd.. Active years: 2014-2025.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Atsushi Yoshida. Retrieved from https://idiyas.com/inventor/atsushi-yoshida-daizw652

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 8 

% Patents Active = 100.0


Average Co-Inventor Count = 3.7

ph-index = 1

Forward Citations = 2(Granted Patents)


Location History:

  • Joetsu, JP (2014 - 2017)
  • Niigata, JP (2017)

Company Filing History:


Years Active: 2014-2025

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8 patents (USPTO):Explore Patents

Title: Atsushi Yoshida: Innovator in Polysilicon Production

Introduction

Atsushi Yoshida is a prominent inventor based in Joetsu, Japan. He has made significant contributions to the field of polysilicon production, holding a total of 8 patents. His work focuses on improving cleaning systems and methods for purifying silane compounds.

Latest Patents

Yoshida's latest patents include a cleaning system and method designed to enhance the production of polysilicon. The cleaning system comprises a first pipe connected to a reactor that produces polysilicon using chlorosilane as a raw material. It features a heat exchanger connected to the first pipe, a second pipe situated between the heat exchanger and the first pipe, and a driving unit located at either the first or second pipe. This innovative system allows a cleaning liquid to circulate effectively through the components.

Another notable patent involves a method for purifying silane or chlorosilane compounds, as well as a method for regenerating weakly basic ion-exchange resin. This technique enables the stable use of ion-exchange resin for removing boron impurities over extended periods during the purification process. By cleaning the resin with a gas containing hydrogen chloride, Yoshida's method enhances the impurity-adsorbing capacity and reduces the amount of resin needed for long-term operations, ultimately lowering disposal costs.

Career Highlights

Atsushi Yoshida is currently employed at Shin-Etsu Chemical Co., Ltd., where he continues to innovate in the field of chemical engineering. His expertise in polysilicon production has positioned him as a key figure in the industry.

Collaborations

Yoshida has collaborated with notable coworkers, including Mitsuo Narita and Masaki Tabata, contributing to advancements in their shared field of expertise.

Conclusion

Atsushi Yoshida's contributions to polysilicon production through his innovative patents and collaborative efforts highlight his importance in the field. His work not only enhances production efficiency but also addresses environmental concerns related to resin disposal.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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