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For the Inventor, By the Inventor

Ibaraki, Japan

Atsushi Sato

This inventor holds 14 USPTO granted patents and 10 published patent applications. Top assignees: Jx Nippon Mining Metals Corporation, Hitachi Maxell, Limited, Jx Advanced Metals Corporation. Active years: 2008-2025.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Atsushi Sato. Retrieved from https://idiyas.com/inventor/atsushi-sato-6tkd3kvj

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 14 

% Patents Active = 92.9

Average Co-Inventor Count = 1.6

ph-index = 3

Forward Citations = 30(Granted Patents)


Company Filing History:

goldMedal12 out of 481 
 
Jx Nippon Mining Metals Corporation
 patents
silverMedal1 out of 1,112 
 
Hitachi Maxell, Limited
 patents
bronzeMedal1 out of 38 
 
Jx Advanced Metals Corporation
 patents

Years Active: 2008-2025

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14 patents (USPTO):Explore Patents
1. 12198911 - Nonmagnetic material-dispersed Fe-Pt based sputtering target (2025-01-14),
2. 11060180 - Ferromagnetic material sputtering target (2021-07-13),
3. 9945026 - Fe-Pt-based sputtering target with dispersed C grains (2018-04-17),
4. 9732414 - Co—Cr—Pt-based sputtering target and method for producing same (2017-08-15),
5. 9228251 - Ferromagnetic material sputtering target (2016-01-05),
6. 9181617 - Sputtering target of ferromagnetic material with low generation of particles (2015-11-10),
7. 9103023 - Nonmagnetic material particle-dispersed ferromagnetic material sputtering target (2015-08-11),
8. 9034155 - Inorganic-particle-dispersed sputtering target (2015-05-19),
9. 8936707 - Sputtering target of nonmagnetic-particle-dispersed ferromagnetic material (2015-01-20),
10. 8932444 - Sputtering target of nonmagnetic-particle-dispersed ferromagnetic material (2015-01-13),
11. 8758476 - Method of producing mixed powder comprising noble metal powder and oxide powder, and mixed powder comprising noble metal powder and oxide powder (2014-06-24),
12. 8679268 - Sputtering target of ferromagnetic material with low generation of particles (2014-03-25),
13. 8568576 - Sputtering target of nonmagnetic-particle-dispersed ferromagnetic material (2013-10-29),
14. 7373649 - Disk cartridge (2008-05-13),

Title: Atsushi Sato: Innovator in Sputtering Technology

Introduction

Atsushi Sato is a prominent inventor based in Ibaraki, Japan. He has made significant contributions to the field of sputtering technology, holding a total of 14 patents. His work focuses on developing advanced materials that enhance the efficiency and effectiveness of sputtering processes.

Latest Patents

One of his latest patents is a nonmagnetic material-dispersed Fe-Pt based sputtering target. This innovation allows for a lower heat treatment temperature for ordering a Fe—Pt magnetic phase while suppressing particle generation during sputtering. The sputtering target comprises Fe, Pt, and Ge, with specific atomic ratios that optimize its performance. Another notable patent is for a BN-containing ferromagnetic material sputtering target. This target is designed to minimize particle generation during sputtering and includes a structure with ferromagnetic metal phases and nonmagnetic material phases.

Career Highlights

Atsushi Sato has worked with notable companies such as JX Nippon Mining & Metals Corporation and JX Advanced Metals Corporation. His experience in these organizations has contributed to his expertise in material science and sputtering technology.

Collaborations

He has collaborated with esteemed colleagues, including Atsutoshi Arakawa and Yuichiro Nakamura, to further advance the field of sputtering technology.

Conclusion

Atsushi Sato's innovative work in sputtering technology has led to significant advancements in material development. His contributions continue to influence the industry and pave the way for future innovations.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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