Atsunori Kawamura

Title: Atsunori Kawamura: Innovator in Polishing Compositions

Introduction

Atsunori Kawamura is a notable inventor based in Owariasahi, Japan. He has made significant contributions to the field of polishing compositions, particularly in applications related to semiconductor manufacturing. With a total of 6 patents to his name, Kawamura's work has been instrumental in advancing polishing technologies.

Latest Patents

Kawamura's latest patents focus on innovative polishing compositions and processes. One of his notable inventions is a polishing composition designed specifically for polishing conductor layers made of copper in semiconductor wiring processes. This composition includes an anionic surfactant and a nonionic surfactant, ensuring that the water contact angle of the polished surface remains at most 60°. Additionally, he has developed a polishing composition that contains a deterioration inhibitor to maintain the polishing capability, along with abrasives such as aluminum oxide and silicon dioxide. These compositions are particularly useful in the semiconductor device manufacturing process.

Career Highlights

Throughout his career, Atsunori Kawamura has worked with prominent companies in the industry, including Fujimi Incorporated and Fujima Incorporated. His experience in these organizations has allowed him to refine his expertise in polishing technologies and contribute to various innovative projects.

Collaborations

Kawamura has collaborated with several professionals in his field, including Shirou Miura and Hitoshi Kodama. These collaborations have further enhanced his work and led to advancements in polishing compositions.

Conclusion

Atsunori Kawamura's contributions to the field of polishing compositions have made a significant impact on semiconductor manufacturing. His innovative patents and collaborations reflect his dedication to advancing technology in this area.