Atsuhiro Tsukune

Title: The Innovations of Atsuhiro Tsukune

Introduction

Atsuhiro Tsukune is a prominent inventor based in Kawasaki, Japan. He has made significant contributions to the field of semiconductor technology, holding a total of 10 patents. His work has been instrumental in advancing the capabilities of semiconductor devices.

Latest Patents

Among his latest patents is a semiconductor device that features insulating layers containing oxygen and a barrier layer made of manganese. This innovative device includes an insulating layer formed over a semiconductor substrate, with a first wire embedded within it. A second wire, which contains manganese, oxygen, and copper, is positioned over the first wire and features a projection extending downwardly, maintaining a distance from the first wire. Another notable patent is a semiconductor device fabrication method, which involves covering a transistor on a semiconductor substrate with a first insulating film. This method includes the formation of conductive vias that connect to the transistor and the semiconductor substrate, ultimately leading to the creation of a multilayer interconnection.

Career Highlights

Atsuhiro Tsukune has had a distinguished career, working with notable companies such as Fujitsu Corporation and Fujitsu Semiconductor Limited. His experience in these organizations has allowed him to develop and refine his innovative ideas in semiconductor technology.

Collaborations

Throughout his career, Tsukune has collaborated with esteemed colleagues, including Fumitake Mieno and Hirosato Ochimizu. These partnerships have contributed to the successful development of his patents and innovations.

Conclusion

Atsuhiro Tsukune's contributions to semiconductor technology through his patents and collaborations highlight his role as a leading inventor in the field. His work continues to influence advancements in semiconductor devices and fabrication methods.