Arun Vishwanathan

Title: Innovations by Arun Vishwanathan in Chemical Mechanical Planarization

Introduction

Arun Vishwanathan is a notable inventor based in Wilmington, DE (US), recognized for his contributions to the field of semiconductor manufacturing. He holds a total of 8 patents, showcasing his expertise and innovative spirit in developing advanced technologies.

Latest Patents

Among his latest patents, Vishwanathan has developed polishing pads for chemical mechanical planarization. This invention presents an improved pad and process for polishing metal damascene structures on a semiconductor wafer. The process involves pressing the wafer against a polymer sheet combined with an aqueous-based liquid that may contain sub-micron particles. It also includes a mechanism for relative motion between the wafer and polishing pad under pressure, resulting in effective planar removal of the wafer's surface. The polishing pad is characterized by low elastic recovery when the load is removed, leading to a largely anelastic mechanical response. This innovative pad features high energy dissipation and stiffness, along with a stable morphology that is easily reproducible. It resists glazing, which reduces the need for frequent and aggressive conditioning. The benefits of this polishing pad include low dishing of metal features, minimal oxide erosion, reduced pad conditioning, extended pad life, high metal removal rates, effective planarization, and lower defectivity.

Another significant patent by Vishwanathan is for hydrolytically stable grooved polishing pads for chemical mechanical planarization. Similar to his previous invention, this improved pad and process also focuses on polishing metal damascene structures on semiconductor wafers. The process and characteristics mirror those of his earlier patent, emphasizing the importance of high energy dissipation, stiffness, and hydrolytic stability.

Career Highlights

Vishwanathan has worked with prominent companies in the industry, including Rodel Holdings, Inc. and Warner-Lambert Company. His experience in these organizations has contributed to his development of innovative solutions in semiconductor manufacturing.

Collaborations

Throughout his career, Vishwanathan has collaborated with notable professionals, including David Shidner and David B. James. These collaborations have likely enriched his work and led to further advancements in his field.

Conclusion

Arun Vishwanathan's contributions to the field of chemical mechanical planarization through his innovative patents demonstrate his significant impact on semiconductor manufacturing. His work continues to influence the industry, paving the way for advancements in technology.