Arthur Y Chen

Title: Innovations of Arthur Y Chen

Introduction

Arthur Y Chen is a notable inventor based in Fremont, CA. He has made significant contributions to the field of etching processes in semiconductor manufacturing. With a total of 5 patents to his name, Chen's work has advanced the efficiency and effectiveness of cleaning processes in etching chambers.

Latest Patents

Chen's latest patents include a "Multiple stage process for cleaning process chambers." This innovative process involves etching multiple layers on a substrate within an etching chamber while simultaneously cleaning multilayer etchant residues from the chamber's surfaces. The method utilizes a process gas with varying compositions of etchant gas to achieve optimal results. Another significant patent is the "Self-cleaning etch process," which allows for the etching of a substrate while concurrently cleaning the non-homogeneous etch residue deposited on the chamber's walls and components. This method enhances the cleaning efficiency during the etching process, eliminating the need for separate cleaning steps.

Career Highlights

Arthur Y Chen is currently employed at Applied Materials, Inc., a leading company in the semiconductor industry. His work has been instrumental in developing innovative solutions that improve manufacturing processes.

Collaborations

Chen has collaborated with esteemed colleagues such as Gerald Z Yin and Xue-Yu Qian, contributing to the advancement of etching technologies.

Conclusion

Arthur Y Chen's contributions to the field of semiconductor manufacturing through his innovative patents have significantly impacted the industry. His work continues to pave the way for advancements in etching processes and cleaning technologies.