The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 29, 2005
Filed:
Jul. 27, 1999
Waiching Chow, Fremont, CA (US);
Raney Williams, Portland, OR (US);
Thorsten B. Lill, Sunnyvale, CA (US);
Arthur Y. Chen, Fremont, CA (US);
Waiching Chow, Fremont, CA (US);
Raney Williams, Portland, OR (US);
Thorsten B. Lill, Sunnyvale, CA (US);
Arthur Y. Chen, Fremont, CA (US);
Applied Materials, Inc., Santa Clara, CA (US);
Abstract
A process for etching multiple layers on a substratein an etching chamberand cleaning a multilayer etchant residue formed on the surfaces of the wallsand components of the etching chamber. In multiple etching steps, process gas comprising different compositions of etchant gas is used to etch layers on the substratethereby depositing a compositionally variant etchant residue inside the chamber. In one cleaning step, a first cleaning gas is added to the process gas to clean a first residue or to suppress deposition of the first residue onto the chamber surfaces. In a second cleaning step, another residue composition is cleaned off the chamber surfaces using a second cleaning gas composition.