Company Filing History:
Years Active: 2002-2005
Title: Waiching Chow: Innovator in Etching Chamber Technology
Introduction
Waiching Chow is a notable inventor based in Fremont, CA, who has made significant contributions to the field of etching chamber technology. With a total of 2 patents, his work focuses on improving processes related to cleaning and conditioning etching chambers used in various manufacturing applications.
Latest Patents
Chow's latest patents include a "Multiple Stage Process for Cleaning Process Chambers" and "Treatment of Etching Chambers Using Activated Cleaning Gas." The first patent describes a process for etching multiple layers on a substrate within an etching chamber while effectively cleaning multilayer etchant residues from the chamber's surfaces. This innovative approach utilizes different compositions of etchant gas in multiple etching steps, followed by a two-step cleaning process involving distinct cleaning gases.
The second patent outlines an apparatus and method for treating and conditioning an etching chamber. This process involves introducing cleaning gas into a remote chamber adjacent to the etching chamber, where microwave or RF energy is applied to create an activated cleaning gas. This activated gas is then used to clean etch residues that are chemically adhered to ceramic surfaces within the chamber, enhancing the efficiency of the cleaning process.
Career Highlights
Waiching Chow is currently employed at Applied Materials, Inc., a leading company in the semiconductor and display technology sectors. His work at Applied Materials has allowed him to develop and refine innovative solutions that address the challenges faced in etching processes.
Collaborations
Chow has collaborated with esteemed colleagues such as Arthur Y Chen and Gerald Z Yin, contributing to advancements in etching technology and enhancing the capabilities of etching chambers.
Conclusion
Waiching Chow's contributions to etching chamber technology through his patents and work at Applied Materials, Inc. highlight his role as an influential inventor in the field. His innovative approaches to cleaning and conditioning etching chambers continue to impact the semiconductor manufacturing industry positively.