Aron Cepler

Title: Innovations of Aron Cepler

Introduction

Aron Cepler is an accomplished inventor based in Albany, NY. He has made significant contributions to the field of semiconductor technology, holding three patents that showcase his innovative approach to measurement and analysis.

Latest Patents

One of his latest patents is titled "Measuring local CD uniformity using scatterometry and machine learning." This invention involves a method, system, and non-transitory computer-readable medium for measuring local critical dimension uniformity of an array of two-dimensional structural elements. The method includes obtaining an acquired optical spectrometry spectrum of the array, feeding it to a trained machine learning process, and outputting the average critical dimension and local critical dimension uniformity of the array. Another notable patent is "Hybridization for characterization and metrology." This computer-implemented method measures a parameter of a semiconductor by receiving a raw signal from a first tool and data from a second tool, then calculating the measured parameter based on these inputs.

Career Highlights

Aron Cepler has worked with prominent companies in the technology sector, including International Business Machines Corporation (IBM) and Nova Corporation. His experience in these organizations has allowed him to develop and refine his innovative ideas in semiconductor measurement and analysis.

Collaborations

Throughout his career, Aron has collaborated with talented individuals such as Dexin Kong and Daniel Schmidt. These partnerships have contributed to the advancement of his projects and the successful development of his patents.

Conclusion

Aron Cepler's work exemplifies the spirit of innovation in the semiconductor industry. His patents reflect a commitment to advancing measurement techniques through the integration of machine learning and advanced methodologies.