The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 14, 2020

Filed:

Jun. 22, 2016
Applicant:

Nova Measuring Instruments Ltd., Rehovot, IL;

Inventors:

Cornel Bozdog, San Jose, CA (US);

Aron Cepler, Albany, NY (US);

Paul Isbester, Castleton, NY (US);

Assignee:
Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/20 (2006.01); G01N 21/956 (2006.01); G01N 21/21 (2006.01); H01L 21/66 (2006.01); H01L 21/8234 (2006.01);
U.S. Cl.
CPC ...
G03F 7/70633 (2013.01); G03F 7/70466 (2013.01); G03F 7/70625 (2013.01); G01N 21/956 (2013.01); G01N 2021/213 (2013.01); H01L 21/823431 (2013.01); H01L 22/12 (2013.01); H01L 22/20 (2013.01);
Abstract

A method and system are presented for use in controlling a multiple patterning process of n patterning stages subsequently applied to a sample to produce a target pattern thereon. The method comprises: providing intermediate measured data indicative of an optical response of the sample after being patterned by m-th patterning stage, 1≤m<n; processing said intermediate measured data, determining at least a location parameter of a predetermined feature of the pattern, and generating measured data indicative of said at least one selected parameter; utilizing said at least location parameter of the predetermined feature for optimizing a data interpretation model for interpretation of measured data indicative of an optical response from the sample being patterned by k-th subsequent patterning stage, m<k≤n.


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