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Title: Armin Bich: Innovator in Optical Measurement Technologies
Introduction
Armin Bich is a notable inventor based in Aalen, Germany. He has made significant contributions to the field of optical measurement technologies, holding a total of 3 patents. His work focuses on innovative methods and devices that enhance the precision of optical surface measurements.
Latest Patents
One of Armin Bich's latest patents is a method of measuring the shape of an optical surface based on computationally combined surface region measurements and an interferometric measuring device. This method involves providing an interferometric measuring device that generates a measurement wave. The device and the test object are arranged consecutively at different measurement positions, allowing various regions of the optical surface to be illuminated by the measurement wave. The method includes measuring positional coordinates of the measuring device at these different positions, obtaining surface region measurements through interferometric techniques, and determining the actual shape of the optical surface by computationally combining these measurements.
Another significant patent is a device and method for measuring lithography masks. This device is designed to enhance the accuracy and efficiency of measuring lithography masks, which are critical in the manufacturing of semiconductor devices.
Career Highlights
Throughout his career, Armin Bich has worked with prominent companies in the industry. He has been associated with Shima Seiki Manufacturing Limited and Carl Zeiss SMT GmbH, where he has contributed to various innovative projects and advancements in optical measurement technologies.
Collaborations
Armin has collaborated with notable professionals in his field, including Albrecht Hof and Dietmar Neugebauer. These collaborations have further enriched his work and contributed to the development of cutting-edge technologies in optical measurements.
Conclusion
Armin Bich's contributions to optical measurement technologies through his patents and collaborations highlight his role as an innovator in the field. His work continues to influence advancements in precision measurement techniques.