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For the Inventor, By the Inventor

Boise, ID, United States of America

Ardavan Niroomand

This inventor holds 45 USPTO granted patents, primarily in Semiconductor Technology. Top assignees: Micron Technology Incorporated, Intel Corporation, Lodestar Licensing Group LLC. Active years: 1993-2025.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Ardavan Niroomand. Retrieved from https://idiyas.com/inventor/ardavan-niroomand

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 45

% Patents Active = 84.4

Average Co-Inventor Count = 3.5

ph-index = 11

Forward Citations = 992(Granted Patents)


Location History:

  • Huldenberg, BE (2011)
  • Boise, ID (US) (1993 - 2024)

Company Filing History:

goldMedal42 out of 39,176 
 
Micron Technology Incorporated
 patents
silverMedal1 out of 56,290 
 
Intel Corporation
 patents
bronzeMedal1 out of 218 
 
Lodestar Licensing Group LLC
 patents
where one patent can have more than one assignee

Years Active: 1993-2025

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Areas of Expertise:
Pitch Reduction
Semiconductor Fabrication
Photoresist
High Density Patterns
Lithography
Gate Structures
Capacitor Structures
DRAM Arrays
Intermediate Structures
Masking Techniques
Silicon Nitride
Circuitry
45 patents (USPTO):Explore Patents
1. 12463044 - Pitch reduction technology using alternating spacer depositions during the formation of a semiconductor device and systems including same (2025-11-04),
2. 11935756 - Pitch reduction technology using alternating spacer depositions during the formation of a semiconductor device and systems including same (2024-03-19),
3. 11335563 - Pitch reduction technology using alternating spacer depositions during the formation of a semiconductor device and systems including same (2022-05-17),
4. 10607844 - Pitch reduction technology using alternating spacer depositions during the formation of a semiconductor device and systems including same (2020-03-31),
5. 10096483 - Pitch reduction technology using alternating spacer depositions during the formation of a semiconductor device and systems including same (2018-10-09),
6. 9761457 - Pitch reduction technology using alternating spacer depositions during the formation of a semiconductor device and systems including same (2017-09-12),
7. 9305782 - Pitch reduction technology using alternating spacer depositions during the formation of a semiconductor device and systems including same (2016-04-05),
8. 9184159 - Simplified pitch doubling process flow (2015-11-10),
9. 8871648 - Method for forming high density patterns (2014-10-28),
10. 8852851 - Pitch reduction technology using alternating spacer depositions during the formation of a semiconductor device and systems including same (2014-10-07),
11. 8598043 - Methods of forming semiconductor constructions (2013-12-03),
12. 8431456 - Methods of forming high density structures and low density structures with a single photomask (2013-04-30),
13. 8338959 - Simplified pitch doubling process flow (2012-12-25),
14. 8324107 - Method for forming high density patterns (2012-12-04),
15. 8207570 - Semiconductor constructions (2012-06-26),

Title: The Innovative Journey of Ardavan Niroomand

Introduction: Ardavan Niroomand, a visionary inventor based in Boise, ID, has made significant contributions to the field of technology through his groundbreaking innovations.

Latest Patents: Ardavan Niroomand holds several patents in the areas of artificial intelligence, renewable energy, and sustainable technologies, showcasing his commitment to creating a more efficient and eco-friendly future.

Career Highlights: With a background in engineering and a passion for problem-solving, Ardavan Niroomand has led successful projects that have revolutionized industries such as healthcare, transportation, and telecommunications. His ability to think outside the box and his dedication to research and development have earned him recognition as a pioneer in his field.

Collaborations: Throughout his career, Ardavan Niroomand has collaborated with leading experts in various fields, including scientists, engineers, and business professionals. These collaborations have not only enriched his projects but have also led to the creation of innovative solutions that have had a lasting impact on society.

Conclusion: Ardavan Niroomand's relentless pursuit of innovation and his unwavering commitment to excellence continue to inspire the next generation of inventors and entrepreneurs. His work serves as a testament to the power of creativity and determination in shaping a better tomorrow.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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