Anthony S Ratkovich

Title: The Innovative Contributions of Anthony S. Ratkovich

Introduction

Anthony S. Ratkovich is a notable inventor based in Bloomington, MN (US). He has made significant contributions to the field of technology, particularly in methods related to silicon nitride removal. With a total of 3 patents to his name, Ratkovich continues to push the boundaries of innovation.

Latest Patents

One of his latest patents describes a method for selectively removing silicon nitride. This method involves providing a substrate with a surface that has silicon nitride exposed on at least one portion and SiGe exposed on another. The process includes dispensing an oxidizing agent onto the substrate's surface to oxidize the exposed SiGe. Following this, a silicon nitride etching agent is dispensed as a liquid stream to remove at least a portion of the silicon nitride.

Career Highlights

Anthony S. Ratkovich is currently employed at Tel Fsi, Inc., where he applies his expertise in innovative technologies. His work has been instrumental in developing advanced methods that enhance the efficiency of semiconductor manufacturing processes.

Collaborations

Throughout his career, Ratkovich has collaborated with talented individuals such as Jeffery W. Butterbaugh and David Scott Becker. These collaborations have fostered a creative environment that encourages the development of groundbreaking technologies.

Conclusion

Anthony S. Ratkovich's contributions to the field of technology through his innovative patents and collaborations highlight his role as a significant inventor. His work continues to influence advancements in semiconductor manufacturing and related technologies.