The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 16, 2015

Filed:

Dec. 06, 2011
Applicants:

Anthony S. Ratkovich, Edina, MN (US);

Jeffery W. Butterbaugh, Eden Prarie, MN (US);

David Scott Becker, Excelsior, MN (US);

Inventors:

Anthony S. Ratkovich, Edina, MN (US);

Jeffery W. Butterbaugh, Eden Prarie, MN (US);

David Scott Becker, Excelsior, MN (US);

Assignee:

TEL FSI, INC., Chaska, MN (US);

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
B44C 1/22 (2006.01); H01L 21/311 (2006.01); H01L 21/67 (2006.01);
U.S. Cl.
CPC ...
H01L 21/31111 (2013.01); H01L 21/67051 (2013.01); H01L 21/6708 (2013.01);
Abstract

A method of selectively removing silicon nitride from a substrate comprises providing a substrate having silicon nitride on a surface thereof; and dispensing phosphoric acid and sulfuric acid onto the surface of the substrate as a mixed acid liquid stream at a temperature greater than about 150° C. In this method, water is added to a liquid solution of the mixed acid liquid stream as or after the liquid solution of the mixed acid liquid stream passes through a nozzle.


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