Anthony Garetto

Title: Anthony Garetto: Innovator in Photomask Analysis

Introduction

Anthony Garetto is a notable inventor based in Jena, Germany. He has made significant contributions to the field of photomask analysis, holding 2 patents that showcase his innovative approaches. His work focuses on improving the methods used to detect defects in photomasks, which are critical components in semiconductor manufacturing.

Latest Patents

Garetto's latest patents include a "Method and system for EUV mask blank buried defect analysis." This invention involves a reflective mask inspection system that utilizes a short wavelength radiation source to irradiate a reflective mask. A detector system captures the short wavelength radiation reflected from the mask, and a controller compares the reflectance images to characterize the mask. This system analyzes the spatially resolved reflectance characteristics of the substrate from various angles, providing valuable information for identifying and characterizing buried defects. This technique represents an advancement over existing systems that rely on atomic force microscopes, which are limited to surface information.

Another significant patent is the "Method for analyzing a photomask," which involves determining a Bossung plot. This method enhances the analysis of photomasks, contributing to more accurate defect detection and characterization.

Career Highlights

Throughout his career, Anthony Garetto has worked with prominent companies in the industry, including Carl Zeiss SMT GmbH and Carl Zeiss SMS Ltd. His experience in these organizations has allowed him to develop and refine his innovative techniques in photomask analysis.

Collaborations

Garetto has collaborated with talented individuals in his field, including Jan Hendrik Peters and Frederik Blumrich. These collaborations have further enriched his work and contributed to advancements in photomask technology.

Conclusion

Anthony Garetto is a distinguished inventor whose work in photomask analysis has led to significant advancements in the field. His innovative patents and collaborations reflect his commitment to improving semiconductor manufacturing processes.