Anja Gissibl

Title: Anja Gissibl: Innovator in Semiconductor Processing

Introduction

Anja Gissibl is a prominent inventor based in Wuppertal, Germany. She has made significant contributions to the field of semiconductor processing, holding 2 patents that showcase her innovative approach to technology.

Latest Patents

One of her latest patents is a method for processing a semiconductor workpiece with metallization. This method involves providing a semiconductor workpiece that includes a metallization layer stack. The stack consists of at least a first layer and a second layer, where the first layer contains a first material and the second layer contains a different second material. The process includes patterning the metallization layer stack through wet etching, ensuring that the etching rate for both materials is substantially the same. Another notable patent is related to porous metal etching, which provides apparatuses and methods for depositing porous metal on a substrate, applying a mask, and performing etching.

Career Highlights

Anja Gissibl is currently employed at Infineon Technologies AG, where she continues to develop innovative solutions in semiconductor technology. Her work has been instrumental in advancing the capabilities of semiconductor processing.

Collaborations

She collaborates with esteemed colleagues such as Hermann Wendt and Thomas Fischer, contributing to a dynamic and innovative work environment.

Conclusion

Anja Gissibl's contributions to semiconductor processing through her patents and work at Infineon Technologies AG highlight her role as a leading inventor in her field. Her innovative methods are paving the way for advancements in technology.