IDiyas

For the Inventor, By the Inventor

San Diego, CA, United States of America

Angelo Pinto

LinkedIn
USPTO Granted Patents = 46 

Average Co-Inventor Count = 3.5

ph-index = 14

Forward Citations = 1,123(Granted Patents)


Location History:

  • Munich, DE (2003 - 2005)
  • Buch Am Erlbach, DE (2002 - 2011)
  • Allen, TX (US) (2002 - 2014)
  • San Diego, CA (US) (2010 - 2024)

Company Filing History:

goldMedal45 out of 29,232 
 
Texas Instruments Corporation
 patents
silverMedal1 out of 41,326 
 
Qualcomm Incorporated
 patents

Years Active: 2002-2024

Loading Chart...
46 patents (USPTO):
1. 11929325 - Mixed pitch track pattern (2024-03-12),
2. 9123570 - Integration scheme for changing crystal orientation in hybrid orientation technology (HOT) using direct silicon bonded (DSB) substrates (2015-09-01),
3. 9053966 - Integrated circuits with aligned (100) NMOS and (110) PMOS finFET sidewall channels (2015-06-09),
4. 8872220 - Integrated circuits with aligned (100) NMOS and (110) PMOS FinFET sidewall channels (2014-10-28),
5. 8846487 - Reduction of STI corner defects during SPE in semiconductor device fabrication using DSB substrate and hot technology (2014-09-30),
6. 8703568 - Advanced CMOS using super steep retrograde wells (2014-04-22),
7. 8558318 - Integration scheme for changing crystal orientation in hybrid orientation technology (HOT) using direct silicon bonded (DSB) substrates (2013-10-15),
8. 8410519 - Integrated circuits with aligned (100) NMOS and (110) PMOS FinFET sidewall channels (2013-04-02),
9. 8247300 - Control of dopant diffusion from buried layers in bipolar integrated circuits (2012-08-21),
10. 8138035 - Method for forming integrated circuits with aligned (100) NMOS and (110) PMOS FinFET sidewall channels (2012-03-20),
11. 8129246 - Advanced CMOS using super steep retrograde wells (2012-03-06),
12. 8043947 - Method to eliminate re-crystallization border defects generated during solid phase epitaxy of a DSB substrate (2011-10-25),
13. 7943479 - Integration of high-k metal gate stack into direct silicon bonding (DSB) hybrid orientation technology (HOT) pMOS process flow (2011-05-17),
14. 7943451 - Integration scheme for reducing border region morphology in hybrid orientation technology (HOT) using direct silicon bonded (DSB) substrates (2011-05-17),
15. 7897994 - Method of making (100) NMOS and (110) PMOS sidewall surface on the same fin orientation for multiple gate MOSFET with DSB substrate (2011-03-01),

Title: Innovations and Contributions of Angelo Pinto in Semiconductor Technology

Introduction

Angelo Pinto, based in San Diego, California, is an accomplished inventor with an impressive portfolio of 46 patents. His work in the semiconductor industry has transformed the way devices are manufactured and optimized, making significant contributions to the field.

Latest Patents

Among his latest innovations, Angelo Pinto developed a Mixed Pitch Track Pattern that enhances routing layers in semiconductor devices. This invention showcases a unique approach to routing layers by incorporating mixed pitch track patterns, ultimately achieving reduced resistance-capacitance (RC) and lower routing costs. Additionally, he created an Integration Scheme for Changing Crystal Orientation in Hybrid Orientation Technology (HOT) using Direct Silicon Bonded (DSB) substrates. This method optimizes carrier mobilities in MOS transistors for CMOS integrated circuits (ICs) by forming (100)-oriented regions for NMOS and (110)-oriented regions for PMOS transistors, significantly improving fabrication techniques for deep submicron CMOS technology.

Career Highlights

Angelo Pinto has garnered extensive experience working with prominent companies, including Texas Instruments Corporation and Qualcomm Incorporated. His valuable contributions to these organizations have further cemented his reputation as a leader in the semiconductor innovation space.

Collaborations

Throughout his career, Angelo has collaborated with notable professionals in the industry, including Jeffrey A. Babcock and Gregory Eric Howard. Their collective expertise has allowed him to drive advancements in semiconductor technology through teamwork and shared vision.

Conclusion

Angelo Pinto's dedication to innovation in the semiconductor field is evident in his impressive list of patents and contributions to major technology firms. His pioneering work continues to influence the design and functionality of modern electronics, showcasing the importance of inventive thought in advancing the industry.

This text is generated by artificial intelligence and may not be accurate.
Please report any incorrect information to support@idiyas.com
Loading…