Fremont, CA, United States of America

Andy Walker

USPTO Granted Patents = 4 

Average Co-Inventor Count = 5.3

ph-index = 1

Forward Citations = 1(Granted Patents)


Company Filing History:


Years Active: 2019-2023

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4 patents (USPTO):Explore Patents

Title: Inventor Profile: Andy Walker

Introduction

Andy Walker, an innovative inventor based in Fremont, CA, has made significant contributions to the field of semiconductor technology. With a total of four patents to his name, his work showcases a commitment to advancing the capabilities of integrated circuits (ICs).

Latest Patents

One of Andy Walker's latest patents focuses on "Patterned Silicide Structures and Methods of Manufacture." This technology is centered around integrated circuits, which include a plurality of trenches disposed in a substrate surrounding a set of silicide regions. The trenches can extend deep into the substrate beneath these silicide regions. The formation of the silicide regions involves implanting metal ions into portions of the substrate that are exposed by a mask layer with narrow pitch openings. Additionally, the trenches are created by selectively etching the substrate, using the set of silicide regions as a trench mask. This innovative method allows for the growth of semiconductor material with varying degrees of crystallinity from the silicide regions in openings that extend through subsequently formed layers down to the silicide regions.

Career Highlights

Throughout his career, Andy Walker has held positions at notable companies including Spin Memory, Inc. and Integrated Silicon Solution, Inc. His work in these companies positions him as a key player in advancing semiconductor technologies and innovations within the industry.

Collaborations

Andy has collaborated with talented professionals, including Kuk-Hwan Kim and Dafna Beery. These partnerships have further enriched his work and have contributed to the successful development of his patented technologies.

Conclusion

Andy Walker's dedication to innovation in semiconductor technology is evident through his patents and collaborations. His advancements in patterned silicide structures are a testament to his expertise and will likely pave the way for future developments in integrated circuits. As he continues to explore new ideas, the impact of his work is expected to resonate within the industry for years to come.

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