New Fairfield, CT, United States of America

Andrew T Pomerene


Average Co-Inventor Count = 4.7

ph-index = 5

Forward Citations = 336(Granted Patents)


Location History:

  • Fairfield County, CT (US) (1998)
  • New Fairfield, CT (US) (1992 - 2000)

Company Filing History:


Years Active: 1992-2000

where 'Filed Patents' based on already Granted Patents

8 patents (USPTO):

Title: The Innovative Mind of Andrew T. Pomerene

Introduction

Andrew T. Pomerene is a notable inventor based in New Fairfield, Connecticut, whose work has led to the issuance of eight patents. His contributions to the field of polymer science and lithography showcase his innovative spirit and technical expertise.

Latest Patents

Among his recent achievements, Pomerene has developed a high sensitivity, photo-active polymer and accompanying developers for producing positive lithographic patterns. This groundbreaking work involves image-wise exposing a polymer with pendant recurring groups to actinic light, x-ray, or e-beam. His efforts have advanced the capabilities of lithographic techniques, which are essential in various manufacturing processes.

Career Highlights

Pomerene's career is marked by impactful roles at significant companies, including International Business Machines Corporation (IBM) and On Demand Cooling Systems, Inc. His experience at these organizations has provided him with a robust foundation to innovate within the tech industry.

Collaborations

Throughout his career, Pomerene has collaborated with remarkable individuals, including David Earle Seeger and Fuad Elias Doany. These partnerships have undoubtedly enriched his research and development endeavors, reflecting the collaborative spirit that is often necessary for significant technological advancements.

Conclusion

Andrew T. Pomerene's dedication to innovation and his significant patent portfolio illustrate his crucial role in advancing polymer science and lithographic technology. His work continues to inspire future inventors and contributes to the ever-evolving landscape of technological development.

This text is generated by artificial intelligence and may not be accurate.
Please report any incorrect information to support@idiyas.com
Loading…