International Business Machines Corporation

Lockheed Martin Corporation

On Demand Cooling Systems, Inc.

Andrew T Pomerene

David Earle Seeger

Fuad Elias Doany

Jane M Shaw

Ari Aviram

Sampath Purushothaman

Marie Angelopoulos

Naftali Eliahu Lustig

Harold John Hovel

Alessandro Cesare Callegari

Douglas Andrew Buchanan

Donis G Flagello

Douglas C Latulipe, Jr

Howard M Clearfield

Fredric D Bailey

Christopher M Scherpereel

Chandrasekhar Narayan

Mitchell S Cohen

Karen Elizabeth Petrillo

Raul E Acosta

Dennis L Rogers

Kurt R Kimmel

Juan R Maldonado

Terence W Spoor

Anthony V DiStefano

Robert R DeVenuto

Positive lithographic patterns are produced by imagewise exposing to actinic light, x-ray or e-beam a polymer having pendant recurring groups selected from the group consisting of

High sensitivity, photo-active polymer and developers for high

Positive lithographic patterns are produced by imagewise exposing to actinic light, x-ray or e-beam copolymers of 2-hydroxyalkyl methacrylate and/or 2-hydroxyalkyl acrylate with alkylmethacrylate and/or alkylacrylate, and then developing the polymer in a developer.

Polymer compositions for high resolution resist applications

An X-ray mask pellicle is capable of protecting the X-ray mask from contaminants and the wafer from contact with the X-ray absorber material of the mask. The X-ray mask pellicle is sufficiently thin to allow X-ray exposure at the required mask to wafer gaps yet is sufficiently durable, replaceable, tough and X-ray resistant to be used in X-ray lithography. A thin (organic or inorganic) X-ray mask pellicle to be placed covering the X-ray mask pattern area is fabricated as a thin film and attached to a support ring. A selected area of the pellicle film, tailored to cover the absorber pattern in the X-ray mask, is etched to decrease its thickness to below 2 .mu.m. If the thin film of the pellicle is not itself conductive, a thin conductive film may be coated on both sides. In an alternative embodiment, the separation between the pellicle and the X-ray mask can be achieved by forming the mask with a stepped profile.

X-ray mask pellicle

The present invention relates to an improved method of depositing a diamond-like carbon film onto a substrate by low temperature plasma-enhanced chemical vapor deposition (PECVD) from a hydrocarbon/helium plasma. More specifically, the diamond-like carbon films of the present invention are deposited onto the substrate by employing acetylene which is heavily diluted with helium as the plasma gas. The films formed using the process of the present invention are characterized as being amorphous and having dielectric strengths comparable to those normally observed for diamond films. More importantly, however is that the films produced herein are thermally stable, optically transparent, absorbent in the ultraviolet range and hard thus making them extremely desirable for a wide variety of applications.

Diamond-like carbon films from a hydrocarbon helium plasma

A manifold design which provides for highly efficient cooling or heating of flowing liquids using a small number of thermoelectric elements is constructed of a thermally insulting material. On exterior surface of at least two sides of the manifold, open channel are formed for use in defining a liquid flow path. On the interior of the manifold there are a plurality of internal chambers, one internal chamber for each side having an exterior channel. These internal chambers are essentially equal in size and are preferably symmetrically disposed within the manifold in alignment with the sides. The channels on the outside of the manifold and the chambers on the inside of the manifold are connected in such a way that liquid would flow in an alternating series of channel and chamber in a single liquid flow path through the manifold. The channels on the exterior of the manifold are sealed by placing a thermally conductive cover plate over each side of the manifold. A thermoelectric device is then placed on the outside of each cover plate. Finally, means for transferring heat to or from the exterior surfaces of the thermoelectric devices provided.

Apparatus for cooling or heating liquids and method of using same

The present invention relates to an improved method of depositing a diamond-like carbon film onto a substrate by low temperature plasma-enhanced chemical vapor deposition (PECVD) from a hydrocarbon/helium plasma. More specifically, the diamond like carbon films of the present invention are deposited onto the substrate by employing acetylene which is heavily diluted with helium as the plasma gas. The films formed using the process of the present invention are characterized as being amorphous and having dielectric strengths comparable to those normally observed for diamond films. More importantly, however is that the films produced herein are thermally stable, optically transparent, absorbent in the ultraviolet range and hard thus making them extremely desirable for a wide variety of applications.

Methods, apparatus and manufacturing processes are set forth which reduce the affects of scattered light in electro-optical devices, fiber optic links, etc., through the use of radiation sensitive compounds which, for example, can be easily applied to a semiconductor wafer when fabricating a solid state integrated receiver. According to the invention, a given radiation sensitive compound is transformed into a light blocking material (i.e., a material that will not transmit light) as a result of a lithographic (and in some cases a photolithographic) process. The resultant blocking material may be easily removed from any regions which is designed to receive transmitted light (for example, detector regions); while any other light sensitive regions remain covered (i.e., are protected) by the blocking material at the conclusion of the process.

Scattered light blocking layer for optoelectronic receivers

Growing community of inventors

New Fairfield, CT, United States of America

Andrew T Pomerene