The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 01, 1999
Filed:
Sep. 23, 1996
Applicant:
Inventors:
Ari Aviram, Croton-on-Hudson, NY (US);
Karen Elizabeth Petrillo, Mahopac, NY (US);
Andrew T Pomerene, New Fairfield, CT (US);
David Earle Seeger, Congers, NY (US);
Assignee:
International Business Machines Corporation, Armonk, NY (US);
Primary Examiner:
Int. Cl.
CPC ...
G03F / ; G03F / ; G03F / ;
U.S. Cl.
CPC ...
430296 ; 430326 ; 430966 ; 430967 ; 430942 ;
Abstract
Positive lithographic patterns are produced by imagewise exposing to actinic light, x-ray or e-beam copolymers of 2-hydroxyalkyl methacrylate and/or 2-hydroxyalkyl acrylate with alkylmethacrylate and/or alkylacrylate, and then developing the polymer in a developer.
Aviram, Ari. (1999). Polymer compositions for high resolution resist applications (U.S. Patent No. 5908732). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/5908732
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile