Westford, MA, United States of America

Andrew Galpin

USPTO Granted Patents = 5 

 

Average Co-Inventor Count = 2.0

ph-index = 3

Forward Citations = 11(Granted Patents)


Location History:

  • Nashua, NH (US) (2010 - 2015)
  • Westford, MA (US) (2017 - 2019)

Company Filing History:


Years Active: 2010-2019

Loading Chart...
Loading Chart...
5 patents (USPTO):Explore Patents

Title: The Innovations of Andrew Galpin

Introduction

Andrew Galpin is a notable inventor based in Westford, MA (US). He has made significant contributions to the field of chemical mechanical planarization (CMP) with a total of 5 patents to his name. His work focuses on enhancing the efficiency and effectiveness of CMP processes, which are crucial in semiconductor manufacturing.

Latest Patents

Among his latest patents is the CMP pad conditioning assembly. This invention features one or more support structures positioned between abrasive regions of the pad conditioning assembly. The design includes channels separating the support structures and abrasive regions, ensuring that the top surface of the support structures is not co-planar with the abrasive regions. This innovative approach improves the performance of the CMP process.

Another significant patent is the chemical mechanical planarization pad conditioner with elongated cutting edges. This CMP pad conditioner is designed to condition a polishing pad effectively. It incorporates a plurality of elongated protrusions that engage the conditioned surface of the polishing pad at various attack angles. This multifaceted manipulation enhances the cut rate of the conditioner assembly and improves the removal of debris from the polishing pad, thereby optimizing the CMP process.

Career Highlights

Andrew Galpin has worked with prominent companies in the industry, including Entegris, Inc. and Freudenberg-NOK General Partnership. His experience in these organizations has allowed him to develop and refine his innovative ideas in CMP technology.

Collaborations

Throughout his career, Andrew has collaborated with talented individuals such as Joseph E. Smith and Christopher J. Wargo. These collaborations have contributed to the advancement of his inventions and the overall progress in the field of CMP.

Conclusion

Andrew Galpin's contributions to the field of chemical mechanical planarization through his innovative patents and collaborations highlight his importance as an inventor. His work continues to influence the semiconductor manufacturing industry, showcasing the impact of his inventions on technology.

This text is generated by artificial intelligence and may not be accurate.
Please report any incorrect information to support@idiyas.com
Loading…