Anderson Chang

Introduction

Anderson Chang, a notable inventor based in Hsin-Chu, Taiwan, has made significant contributions to the field of semiconductor manufacturing. His innovative approach has been recognized through the granting of a patent that enhances the accuracy of line measurement techniques essential in modern technology.

Latest Patents

Anderson Chang holds a patent for a method entitled "Line end spacing measurement." This invention involves providing collinear first and second lines within a mask layer over a substrate. The first line features a first line end and adjacent first line body, while the second line has a second line end alongside an adjacent second line body. The process entails measuring the line widths of both the first and second line bodies, identifying effective line end positions based on these dimensions, and subsequently measuring the distance between the effective line end positions to determine effective line end spacing. This method represents a crucial advancement in ensuring precision in semiconductor fabrication.

Career Highlights

Anderson currently works with Taiwan Semiconductor Manufacturing Company Limited, a leading entity in the semiconductor sector. His role involves pioneering methodologies that contribute to the refinement and efficiency of manufacturing processes. His patent reflects his dedication to enhancing technological standards in the industry.

Collaborations

In his professional journey, Anderson has had the pleasure of collaborating with esteemed colleagues such as Jiann Yuan Huang and Chih-Ming Ke. Their collective expertise and shared vision have likely played a pivotal role in driving innovative solutions within their field.

Conclusion

Anderson Chang's contributions through his patent on line end spacing measurement not only highlight his ingenuity as an inventor but also embody the essence of continuous innovation in the semiconductor industry. As he continues to develop and refine techniques at Taiwan Semiconductor Manufacturing Company Limited, his work promises to influence the future of semiconductor manufacturing significantly.