The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 01, 2008
Filed:
Apr. 04, 2006
Jiann Yuan Huang, Hsin-Chu, TW;
Anderson Chang, Hsin-Chu, TW;
Chih-ming KE, Hsinchu, TW;
Heng-jen Lee, Hsinchu County, TW;
Chin-hsiang Lin, Hsinchu, TW;
Tsai-sheng Gau, HsinChu, TW;
Jiann Yuan Huang, Hsin-Chu, TW;
Anderson Chang, Hsin-Chu, TW;
Chih-Ming Ke, Hsinchu, TW;
Heng-Jen Lee, Hsinchu County, TW;
Chin-Hsiang Lin, Hsinchu, TW;
Tsai-Sheng Gau, HsinChu, TW;
Taiwan Semiconductor Manufacturing Company, Ltd., Hsin-Chu, TW;
Abstract
A method including: providing collinear first and second lines in a mask layer over a substrate, the first line having at one end a first line end and having a first line body adjacent the first line end, and the second line having at one end a second line end and having a second line body adjacent the second line end; measuring line widths of the first line body and the second line body; locating effective line end positions for the first line end based on the line width of the first line body and for the second line end based on the line width of the second line body; and measuring a distance between the effective line end positions, as an effective line end spacing.