Taiwan Semiconductor Manufacturing Comp. Ltd.

Anderson Chang

Chin-Hsiang Lin

Tsai-Sheng Gau

Chih-Ming Ke

Heng-Jen Lee

Jiann Yuan Huang

A method including: providing collinear first and second lines in a mask layer over a substrate, the first line having at one end a first line end and having a first line body adjacent the first line end, and the second line having at one end a second line end and having a second line body adjacent the second line end; measuring line widths of the first line body and the second line body; locating effective line end positions for the first line end based on the line width of the first line body and for the second line end based on the line width of the second line body; and measuring a distance between the effective line end positions, as an effective line end spacing.

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Hsin-Chu, Taiwan

Anderson Chang