Ana R Londergan

Title: Ana R Londergan: Innovator in Composite Conductive Films

Introduction

Ana R Londergan is a prominent inventor based in Campbell, California. She has made significant contributions to the field of engineering, particularly in the development of composite conductive films through atomic layer deposition. With a total of six patents to her name, Londergan's work has implications for various applications in electronics.

Latest Patents

Londergan's latest patents focus on methods and procedures for engineering composite conductive films. One of her notable inventions describes a composite film comprised of three layers formed by atomic layer deposition (ALD) on a substrate with a substrate interface surface. The first layer is coupled to the substrate interface surface, providing adhesion and initiating layer-by-layer ALD growth. The second layer serves as a conducting diffusion barrier between the substrate and the subsequent overlaying film. The third layer is designed to provide adhesion and a texture template for the next overlaying film. These composite engineered barrier structures are particularly useful in interconnect, capacitor, and transistor applications.

Career Highlights

Throughout her career, Ana R Londergan has worked with notable organizations such as Genus, Inc. and the Research Foundation of SUNY in New York. Her experience in these institutions has allowed her to refine her expertise in the engineering of advanced materials.

Collaborations

Londergan has collaborated with esteemed colleagues, including Thomas E Seidel and Alain E Kaloyeros. These partnerships have contributed to her innovative research and development efforts.

Conclusion

Ana R Londergan stands out as a significant figure in the field of composite conductive films. Her innovative patents and collaborations highlight her dedication to advancing technology in electronics.