Hsinchu, Taiwan

An-Kuo Yang


Average Co-Inventor Count = 4.0

ph-index = 1

Forward Citations = 1(Granted Patents)


Company Filing History:


Years Active: 2010-2019

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5 patents (USPTO):Explore Patents

Title: Innovator Spotlight: An-Kuo Yang

Introduction: An-Kuo Yang, an accomplished inventor based in Hsinchu, Taiwan, has made significant contributions to the field of photolithography. With a total of five patents to his name, he is recognized for his innovative methods that enhance the quality assessment of light sources in photolithographic processes.

Latest Patents: Yang's latest patent, titled "Methods of Determining Quality of a Light Source," focuses on improving the efficiency and effectiveness of light sources used in photolithography. The method involves exposing an image sensor array to light from a light source, allowing for the collection of addresses and respective intensities at various locations on a pupil map. The outer and inner curves of the pupil map will be defined based on this data. Should the addresses form a predetermined pattern relative to these curves, the light source can then be implemented in the photolithographic process. This innovation represents a significant advancement in ensuring the reliability and quality of light in intricate manufacturing processes.

Career Highlights: Currently, An-Kuo Yang is associated with Taiwan Semiconductor Manufacturing Company Ltd., a leading entity in the semiconductor industry. His contributions have helped to streamline photolithographic techniques, which are crucial in the production of semiconductor devices.

Collaborations: Throughout his career, Yang has collaborated with notable colleagues, including Nan-Jung Chen and Jui-Chung Peng. Working alongside such talented individuals has facilitated an environment of innovation, fostering advancements that have significantly impacted the semiconductor field.

Conclusion: An-Kuo Yang exemplifies the spirit of innovation and creativity in technology. His contributions, particularly in the assessment and quality of light in photolithography, position him as a significant figure in the semiconductor industry. As he continues to innovate, he is undoubtedly paving the way for future advancements in the field.

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