Taiwan Semiconductor Manufacturing Comp. Ltd.

An-Kuo Yang

Jui-Chung Peng

Nan-Jung Chen

Kevin Hung

Chun-Hung Lin

Chien-Hsun Lin

Yao-Wen Guo

Methods for determining a quality of a light source applied to a photolithographic process are provided. An image sensor array is exposed to a light from a light source. Addresses and respective intensities corresponding to a plurality of locations on a pupil map representing intensity of the light from on the image sensor array. At least one of an inner curve and an outer curve of the pupil map is defined based upon the collected addresses and respective intensities. The light source is applied to a photolithographic process if the addresses have a predetermined pattern relative to the at least one of the inner curve and the outer curve.

Methods of determining quality of a light source

A method for processing substrates to manufacture semiconductor structures thereon includes analyzing at least one first processing parameter of a first apparatus for processing a substrate, thereby yielding at least one first throughput rate of the first apparatus. At least one second processing parameter of a second apparatus is analyzed for processing the substrate, thereby yielding at least one second throughput rate of the second apparatus. The first throughput rate and the second throughput rate are compared, thereby yielding at least one comparison result for processing the substrate.

Methods and systems for forming semiconductor structures

Growing community of inventors

Hsinchu, Taiwan

An-Kuo Yang