logo

For the Inventor, By the Inventor

Providence, RI, United States of America

Alfred T Jeffries, Iii

This inventor holds 26 USPTO granted patents, primarily in Photoactive Compositions. Top assignees: Ocg Microelectronic Materials, Inc., Olin Hunt Specialty Products Inc., Arch Specialty Chemicals, Inc.. Active years: 1986-2000.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Alfred T Jeffries, Iii. Retrieved from https://idiyas.com/inventor/alfred-t-jeffries-iii

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 26

% Patents Active = 100.0

Average Co-Inventor Count = 2.2

ph-index = 7

Forward Citations = 147(Granted Patents)


Company Filing History:

goldMedal16 out of 73 
 
Ocg Microelectronic Materials, Inc.
 patents
silverMedal7 out of 45 
 
Olin Hunt Specialty Products Inc.
 patents
bronzeMedal1 out of 58 
 
Arch Specialty Chemicals, Inc.
 patents
4. 1 out of 25 
 
Olin Microelectronic Chemicals, Inc.
 patents
5. 1 out of 21 
 
Philip a. Hunt Chemical Corporation
 patents

Years Active: 1986-2000

Loading Chart...
Areas of Expertise:
Photosensitive
Diazonaphthoquinone
Oligomers
Novolak Resins
Phenolic Derivatives
Light-Sensitive
Radiation-Sensitive
Antireflective Coatings
Image Formation
Thermally Stable
Photoactive Compounds
26 patents (USPTO):Explore Patents
1. 6140026 - Photosensitive diazonaphthoquinone esters based on selected cyclic alkyl (2000-10-31),
2. 6040107 - Photosensitive diazonaphthoquinone esters based on selected cyclic alkyl (2000-03-21),
3. 5366843 - Coated substrate utilizing composition including selected phenolic (1994-11-22),
4. 5346808 - Positive image formation utilizing o-quinonediazide composition (1994-09-13),
5. 5346799 - Novolak resins and their use in radiation-sensitive compositions wherein (1994-09-13),
6. 5312720 - Process of developing a positive image utilizing o-naphthoquinone (1994-05-17),
7. 5302688 - Selected block phenolic oligomers and their use in phenolic resin (1994-04-12),
8. 5283374 - Selected phenolic derivatives of 4-(4-hydroxyphenyl)-cyclohexanone and (1994-02-01),
9. 5278021 - O-naphthoquinone diazide sulfonyl esters of (1994-01-11),
10. 5235022 - Selected block copolymer novolak binder resins (1993-08-10),
11. 5234795 - Process of developing an image-wise exposed resist-coated substrate (1993-08-10),
12. 5232819 - Selected block phenolic oligomers and their use in phenolic resin (1993-08-03),
13. 5220073 - Selected trihydroxybenzophenone compounds (1993-06-15),
14. 5219714 - Selected trihydroxybenzophenone compounds and their use in photoactive (1993-06-15),
15. 5196517 - Selected trihydroxybenzophenone compounds and their use as photoactive (1993-03-23),

Title: Alfred T Jeffries, III: A Pioneer in Innovation

Introduction:

Alfred T Jeffries, III is a renowned inventor based in Providence, RI, whose visionary ideas and groundbreaking inventions continue to inspire the next generation of inventors. With a commitment to innovation and creativity, Jeffries has established himself as a true pioneer in the world of inventions.

Latest Patents:

Alfred T Jeffries, III holds an impressive total of 26 patents. His latest patents include photosensitive diazonaphthoquinone esters based on selected cyclic alkyl. These compounds are crucial in radiation-sensitive compositions and processes for forming positive patterned images.

Career Highlights:

Throughout his career, Alfred T Jeffries, III has made significant contributions to the field of inventions. He has worked with companies such as OCG Microelectronic Materials, Inc. and Olin Hunt Specialty Products Inc., where he has played a key role in developing innovative technologies.

Collaborations:

Jeffries has collaborated with esteemed coworkers such as Andrew J Blakeney and Medhat A Toukhy. Together, they have combined their expertise to create cutting-edge solutions and push the boundaries of what is possible in the world of inventions.

Conclusion:

Alfred T Jeffries, III's dedication to innovation and his creative vision have made him a standout figure in the field of inventions. His pioneering spirit and remarkable contributions continue to shape the future of invention and inspire aspiring inventors worldwide.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
Loading…