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Cheshire, CT, United States of America

Ocg Microelectronic Materials, Inc.

USPTO Granted Patents = 71

Trademarks = 1

Forward Citations = 556

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42 inventors (with patents filed for the assignee):

Medhat A Toukhy (20 out of 31 patents)

Kenji Honda (19 out of 40 patents)

Alfred T Jeffries, Iii (16 out of 26 patents)

4. Andrew J Blakeney (12 out of 45 patents)

5. Sobhy Tadros (11 out of 11 patents)

6. Thomas R Sarubbi (10 out of 14 patents)

7. Joseph J Sizensky (7 out of 16 patents)

8. Lawrence Ferreira (5 out of 16 patents)

9. Tripunithura V Jayaraman (4 out of 4 patents)

10. David J Brzozowy (4 out of 5 patents)

11. Robert F Rogler (3 out of 3 patents)

12. Charles E Ebersole (3 out of 3 patents)

13. Arturo N Medina (3 out of 5 patents)

14. Taishih Maw (3 out of 7 patents)

15. John Griffiths (2 out of 19 patents)

Core Competencies:

Photoresist Compositions

Chemically Amplified Radiation-Sensitive Composition

O-Quinonediazide Sulfonic Acid Esters

Novolak Binder Resins

Non-Corrosive Photoresist Stripper

Radiation-Sensitive Mixtures

Phenolic Resins

Metal Impurity Removal

Positive Image Formation

Environmentally Safe Chemical Dispensing

Lithographic Applications

Sensitivity Enhancers

71 patents: Sort by Forward Citations

1. 5776657 - Wet-chemical developable, etch-stable photoresist for UV radiation with (1998-07-07),

2. 5663038 - Process for the preparation of partially protected phenolic resins (1997-09-02),

3. 5648324 - Photoresist stripping composition (1997-07-15),

4. 5602260 - Selected O-quinonediazide sulfonic acid esters of phenolic compounds and (1997-02-11),

5. 5597678 - Non-corrosive photoresist stripper composition (1997-01-28),

6. 5565304 - Chemically amplified radiation-sensitive composition used in a process (1996-10-15),

7. 5561105 - Chelating reagent containing photoresist stripper composition (1996-10-01),

8. 5558978 - Photoresist compositions containing copolymers having acid-labile groups (1996-09-24),

9. 5554797 - Tetra (hydroxphenyl) alkanes (1996-09-10),

10. 5550004 - Chemically amplified radiation-sensitive composition (1996-08-27),

11. 5547814 - O-quinonediazide sulfonic acid esters of phenolic compounds and their (1996-08-20),

12. 5545353 - Non-corrosive photoresist stripper composition (1996-08-13),

13. 5541033 - Selected o-quinonediazide sulfonic acid esters of phenolic compounds and (1996-07-30),

14. 5507978 - Novolak containing photoresist stripper composition (1996-04-16),

15. 5494785 - High ortho-ortho bonded novolak binder resins and their use in a process (1996-02-27),

OCG Microelectronic Materials, Inc. is a leading provider of advanced microelectronic materials for various industries. With a focus on innovation and quality, we deliver superior materials that empower our customers to develop cutting-edge electronic products. Our extensive product portfolio includes specialty chemicals, photoresists, etchants, and more. We pride ourselves on our dedicated team of experts who collaborate closely with customers to provide tailored solutions. Visit our website to explore our range of products and learn more about how we can support your microelectronics manufacturing needs.

This text is generated by artificial intelligence and may not be accurate.

Company Badge

USPTO Data Jan 1 1976 - Dec 23 2025

71 Patents

#1 in Cheshire, CT

#118 in Connecticut

#4,945 in US

#10,076 in the World

Cheshire, CT, United States of America

Ocg Microelectronic Materials, Inc.

Forward Citations = 556

42 inventors:

Medhat A Toukhy (20 out of 31 patents)

Kenji Honda (19 out of 40 patents)

Alfred T Jeffries, Iii (16 out of 26 patents)

4. Andrew J Blakeney (12 out of 45 patents)

5. Sobhy Tadros (11 out of 11 patents)

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