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West Paterson, NJ, United States of America

Ocg Microelectronic Materials, Inc.

USPTO Granted Patents = 73

Trademarks = 1

Forward Citations = 566

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42 inventors (with patents filed for the assignee):

Medhat A Toukhy (20 out of 31 patents)

Kenji Honda (19 out of 40 patents)

Alfred T Jeffries, Iii (16 out of 26 patents)

4. Andrew J Blakeney (12 out of 45 patents)

5. Sobhy Tadros (11 out of 11 patents)

6. Thomas R Sarubbi (10 out of 14 patents)

7. Joseph J Sizensky (7 out of 16 patents)

8. Lawrence Ferreira (5 out of 16 patents)

9. Tripunithura V Jayaraman (4 out of 4 patents)

10. David J Brzozowy (4 out of 5 patents)

11. Arturo Norberto Medina (3 out of 32 patents)

12. Robert F Rogler (3 out of 3 patents)

13. Charles E Ebersole (3 out of 3 patents)

14. Taishih Maw (3 out of 7 patents)

15. John Griffiths (2 out of 19 patents)

Core Competencies:

Photoresist

Novolak Resin

Radiation-Sensitive

Chemical Composition

Stripping Method

Thermally Stable

O-Quinonediazide

Phenolic Resin

Sensitivity Enhancer

Developing Process

Image Formation

Photoactive Compound

73 patents: Sort by Forward Citations

1. 5776657 - Wet-chemical developable, etch-stable photoresist for UV radiation with (1998-07-07),

2. 5663038 - Process for the preparation of partially protected phenolic resins (1997-09-02),

3. 5648324 - Photoresist stripping composition (1997-07-15),

4. 5602260 - Selected O-quinonediazide sulfonic acid esters of phenolic compounds and (1997-02-11),

5. 5597678 - Non-corrosive photoresist stripper composition (1997-01-28),

6. 5565304 - Chemically amplified radiation-sensitive composition used in a process (1996-10-15),

7. 5561105 - Chelating reagent containing photoresist stripper composition (1996-10-01),

8. 5558978 - Photoresist compositions containing copolymers having acid-labile groups (1996-09-24),

9. 5554797 - Tetra (hydroxphenyl) alkanes (1996-09-10),

10. 5550004 - Chemically amplified radiation-sensitive composition (1996-08-27),

11. 5547814 - O-quinonediazide sulfonic acid esters of phenolic compounds and their (1996-08-20),

12. 5545353 - Non-corrosive photoresist stripper composition (1996-08-13),

13. 5541033 - Selected o-quinonediazide sulfonic acid esters of phenolic compounds and (1996-07-30),

14. 5507978 - Novolak containing photoresist stripper composition (1996-04-16),

15. 5494785 - High ortho-ortho bonded novolak binder resins and their use in a process (1996-02-27),

OCG Microelectronic Materials, Inc. is a leading provider of advanced microelectronic materials for various industries. With a focus on innovation and quality, we deliver superior materials that empower our customers to develop cutting-edge electronic products. Our extensive product portfolio includes specialty chemicals, photoresists, etchants, and more. We pride ourselves on our dedicated team of experts who collaborate closely with customers to provide tailored solutions. Visit our website to explore our range of products and learn more about how we can support your microelectronics manufacturing needs.

This text is generated by artificial intelligence and may not be accurate.

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USPTO Data Jan 1 1976 - Sep 15 2026

73 Patents

#1 in West Paterson, NJ

#217 in New Jersey

#5,030 in US

#10,240 in the World

West Paterson, NJ, United States of America

Ocg Microelectronic Materials, Inc.

Forward Citations = 566

42 inventors:

Medhat A Toukhy (20 out of 31 patents)

Kenji Honda (19 out of 40 patents)

Alfred T Jeffries, Iii (16 out of 26 patents)

4. Andrew J Blakeney (12 out of 45 patents)

5. Sobhy Tadros (11 out of 11 patents)

Please report any incorrect information to [email protected]

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