Location History:
- Lincoln, RI (US) (1992 - 1994)
- Providence, RI (US) (1994)
- Bristol, RI (US) (2005)
Company Filing History:
4 out of 73 
1 out of 58 Years Active: 1992-2005
Title: The Innovative Contributions of David J Brzozowy
Introduction
David J Brzozowy is a notable inventor based in Lincoln, Rhode Island, known for his significant contributions to the field of photoresist compositions. With a total of five patents to his name, Brzozowy has made strides in developing radiation-sensitive materials that are essential in various technological applications.
Latest Patents
One of Brzozowy's latest patents focuses on photoresist compositions that utilize novolak resins. These radiation-sensitive compositions are designed for producing patterned images on substrates. The novolak binder resin is created through the condensation reaction of a mixture of phenolic monomers with at least one aldehyde source. The specific phenolic monomers include 2,6-dimethylphenol, 2,3-dimethylphenol, and para-substituted lower alkyl phenols. This innovative approach allows for the creation of positive-working photoresists that are crucial in the microelectronics industry.
Career Highlights
Throughout his career, Brzozowy has worked with prominent companies such as OCG Microelectronic Materials, Inc. and Arch Specialty Chemicals, Inc. His experience in these organizations has contributed to his expertise in developing advanced materials for electronic applications.
Collaborations
Brzozowy has collaborated with notable professionals in his field, including Andrew J Blakeney and Tripunithura V Jayaraman. These collaborations have further enhanced his research and development efforts in the area of photoresist technology.
Conclusion
David J Brzozowy's innovative work in photoresist compositions showcases his significant impact on the field of microelectronics. His patents and collaborations reflect a commitment to advancing technology through research and development.