Aurora, IL, United States of America

Alexander W Hains

USPTO Granted Patents = 9 

 

Average Co-Inventor Count = 4.2

ph-index = 2

Forward Citations = 22(Granted Patents)


Company Filing History:


Years Active: 2016-2025

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9 patents (USPTO):

Title: **Innovator Spotlight: Alexander W. Hains**

Introduction

Alexander W. Hains is a distinguished inventor based in Aurora, IL, with a notable portfolio of eight patents. His contributions to the field of chemical engineering, particularly in chemical mechanical polishing compositions, have significantly advanced industry practices.

Latest Patents

Among his recent patents, two stand out:

1. **CMP Composition Including a Novel Abrasive** - This innovative chemical mechanical polishing composition comprises a liquid carrier and positively charged colloidal silica particles. The particles are characterized by a number average aspect ratio greater than 1.25 and a normalized particle size span by weight of over 0.42. This unique formulation may also include optional components, such as an iron-containing accelerator and a tungsten etch inhibitor, specifically when applied in tungsten CMP compositions.

2. **Self-Stopping Polishing Composition and Method for Bulk Oxide Planarization** - This invention introduces a chemical-mechanical polishing composition that features an abrasive, a self-stopping agent, an aqueous carrier, and a cationic polymer. It also outlines a method for effectively polishing dielectric substrates.

Career Highlights

Hains has built his career in notable companies such as Cabot Microelectronics Corporation and CMC Materials, Inc. Throughout his time at these organizations, he has focused on developing cutting-edge materials and techniques for the semiconductor industry.

Collaborations

Collaboration is a vital aspect of innovation, and Hains has worked alongside distinguished colleagues, including Viet Lam and Tina C. Li. Their combined expertise has further propelled advancements in chemical mechanical polishing technologies.

Conclusion

Alexander W. Hains exemplifies a commitment to innovation and practical application in his field. Through his substantial contributions and collaborative endeavors, he continues to shape the future of chemical mechanical polishing techniques, fostering advancements that have a lasting impact on the industry.

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