This inventor holds 10 USPTO granted patents and 7 published patent applications and 5 EPO patents. Top assignees: Cabot Microelectronics Corporation, Cmc Materials, Inc.. Active years: 2016-2026.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2016-2026
Title: **Innovator Spotlight: Alexander W. Hains**
Introduction
Alexander W. Hains is a distinguished inventor based in Aurora, IL, with a notable portfolio of eight patents. His contributions to the field of chemical engineering, particularly in chemical mechanical polishing compositions, have significantly advanced industry practices.
Latest Patents
Among his recent patents, two stand out:
1. **CMP Composition Including a Novel Abrasive** - This innovative chemical mechanical polishing composition comprises a liquid carrier and positively charged colloidal silica particles. The particles are characterized by a number average aspect ratio greater than 1.25 and a normalized particle size span by weight of over 0.42. This unique formulation may also include optional components, such as an iron-containing accelerator and a tungsten etch inhibitor, specifically when applied in tungsten CMP compositions.
2. **Self-Stopping Polishing Composition and Method for Bulk Oxide Planarization** - This invention introduces a chemical-mechanical polishing composition that features an abrasive, a self-stopping agent, an aqueous carrier, and a cationic polymer. It also outlines a method for effectively polishing dielectric substrates.
Career Highlights
Hains has built his career in notable companies such as Cabot Microelectronics Corporation and CMC Materials, Inc. Throughout his time at these organizations, he has focused on developing cutting-edge materials and techniques for the semiconductor industry.
Collaborations
Collaboration is a vital aspect of innovation, and Hains has worked alongside distinguished colleagues, including Viet Lam and Tina C. Li. Their combined expertise has further propelled advancements in chemical mechanical polishing technologies.
Conclusion
Alexander W. Hains exemplifies a commitment to innovation and practical application in his field. Through his substantial contributions and collaborative endeavors, he continues to shape the future of chemical mechanical polishing techniques, fostering advancements that have a lasting impact on the industry.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile