Burghausen, Germany

Alexander Vollkopf

This inventor holds 3 USPTO granted patents. Top assignee: Siltronic Ag. Active years: 2022-2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Alexander Vollkopf. Retrieved from https://idiyas.com/inventor/alexander-vollkopf

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

% Patents Active = 100.0

Average Co-Inventor Count = 3.0

ph-index = 1

Forward Citations = 1(Granted Patents)


Company Filing History:


Years Active: 2022-2026

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3 patents (USPTO):Explore Patents

Title: Alexander Vollkopf: Shaping the Future of Technology

Introduction:

Alexander Vollkopf, a passionate inventor based in Burghausen, DE, is known for his relentless pursuit of excellence in the field of technology. With a knack for innovation, he continues to inspire the next generation of inventors with his groundbreaking work.

Latest Patents:

Vollkopf's latest patents include a groundbreaking invention in the form of a semiconductor wafer of monocrystalline silicon. This invention involves epitaxially coated semiconductor wafers comprising a p-doped substrate wafer and a p-doped epitaxial layer of monocrystalline silicon.

Career Highlights:

With a total of 2 patents to his name, Alexander Vollkopf has made significant contributions to the field of technology. He currently works at Siltronic AG, a prominent company in the industry, where his innovative thinking and dedication to excellence shine through in his work.

Collaborations:

Throughout his career, Vollkopf has collaborated with notable individuals in the field, including coworkers Andreas Sattler and Karl Mangelberger. Together, they have worked towards pushing the boundaries of innovation and shaping the future of technology.

Conclusion:

In conclusion, Alexander Vollkopf's passion for innovation and his dedication to excellence have cemented his position as a pioneering inventor in the field of technology. His work continues to inspire others and pave the way for future advancements in the industry.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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