Alexander Hendrik Van Veen

Title: Contributions of Alexander Hendrik Van Veen to Particle Optics

Introduction: Alexander Hendrik Van Veen is an esteemed inventor based in Rotterdam, Netherlands. With a total of two patents to his name, Van Veen has made significant strides in the field of charged particle optics. His innovations focus on advanced projection lens arrangements that improve the accuracy and efficiency of charged particle beam systems.

Latest Patents: Van Veen's latest inventions include a sophisticated projection lens arrangement. This invention pertains to a charged particle optical system that features a beamlet generator designed to produce multiple charged particle beamlets. It incorporates an electrostatic deflection system that allows for the effective scanning of these beamlets over a target. The system utilizes two electrostatic deflectors arranged such that each beamlet passes through both, enabling enhanced control during operation. Moreover, the design ensures that the voltages applied to these deflectors are of opposite signs, optimizing the functionality of the charged particle system.

In addition to this, Van Veen has developed a charged particle multi-beamlet system. This system includes a plate with multiple holes, each equipped with corresponding electrostatic projection lens systems. These systems enable precise focusing of the electron beamlets onto a target surface using a unified control voltage. The electrostatic projection lens systems can be controlled by a common electrical signal, simplifying the focusing process without necessitating individual adjustments for each beamlet.

Career Highlights: Van Veen's career is marked by his contributions to Mapper Lithography IP B.V., where he applies his expertise in optics and engineering. His innovative approaches are vital in advancing the technology utilized in advanced lithography systems.

Collaborations: He collaborates with notable colleagues, including Marco Jan Jaco Wieland and Bert Jan Kampherbeek. Working alongside such talented professionals allows Van Veen to enhance his projects, bringing about cutting-edge innovations.

Conclusion: Alexander Hendrik Van Veen's work stands as a testimony to the progress being made in the realm of charged particle optics. His patents not only contribute to the field of lithography but also reflect the innovative spirit driving advancements in technology today. As the landscape of optics continues to evolve, Van Veen's contributions will undoubtedly pave the way for future developments.