The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 11, 2015
Filed:
Nov. 25, 2011
Marco Jan Jaco Wieland, Delft, NL;
Bert Jan Kampherbeek, Delft, NL;
Alexander Hendrik Van Veen, Rotterdam, NL;
Pieter Kruit, Delft, NL;
Stijn Willem Steenbrink, The Hague, NL;
Marco Jan Jaco Wieland, Delft, NL;
Bert Jan Kampherbeek, Delft, NL;
Alexander Hendrik Van Veen, Rotterdam, NL;
Pieter Kruit, Delft, NL;
Stijn Willem Steenbrink, The Hague, NL;
MAPPER LITHOGRAPHY IP B.V., Delft, NL;
Abstract
The invention relates to a charged particle optical system comprising a beamlet generator for generating a plurality of charged particle beamlets, an electrostatic deflection system for deflecting the beamlets, and a projection lens system for directing the beamlets from the beamlet generator towards the target. The electrostatic deflection system comprises a first electrostatic deflector and a second electrostatic deflector for scanning charged particle beamlets over the target. The second electrostatic deflector is located behind the first electrostatic deflector so that, during operation of the system, a beamlet generated by the beamlet generator passes both of the electrostatic deflectors. During operation of the first and second electrostatic deflectors the system is adapted to apply voltages on the first electrostatic deflector and the second electrostatic deflector of opposite sign.