The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 03, 2012
Filed:
Feb. 26, 2009
Marco Jan Jaco Wieland, Delft, NL;
Bert Jan Kampherbeek, Delft, NL;
Alexander Hendrik Van Veen, Rotterdam, NL;
Pieter Kruit, Delft, NL;
Stijn Willem Herman Karel Steenbrink, Utrecht, NL;
Marco Jan Jaco Wieland, Delft, NL;
Bert Jan Kampherbeek, Delft, NL;
Alexander Hendrik Van Veen, Rotterdam, NL;
Pieter Kruit, Delft, NL;
Stijn Willem Herman Karel Steenbrink, Utrecht, NL;
Mapper Lithography IP B.V., Delft, NL;
Abstract
A charged particle multi-beamlet system for exposing a target using a plurality of beamlets. The system comprises a first plate having a plurality of holes formed in it, with a plurality of electrostatic projection lens systems formed at the location of each hole so that each electron beamlet passes through a corresponding projection lens system. The holes have sufficiently uniform placement and dimensions to enable focusing of the beamlets onto the surface of the target using a common control voltage. Preferably the electrostatic projection lens systems are controlled by a common electrical signal to focus the electron beamlets on the surface without correction of the focus or path of individual electron beamlets.