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For the Inventor, By the Inventor

Corona, CA, United States of America

Alexander Dunaevsky

LinkedIn
USPTO Granted Patents = 8 

 

Average Co-Inventor Count = 3.4

ph-index = 2

Forward Citations = 6(Granted Patents)


Company Filing History:

goldMedal8 out of 87 
 
Tae Technologies, Inc.
 patents

Years Active: 2021-2025

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8 patents (USPTO):Explore Patents
1. 12464631 - Ion beam exclusion paths on the target surface to optimize neutron beam performance (2025-11-04),
2. 12154750 - Systems, devices, and methods for ion beam modulation (2024-11-26),
3. 12083361 - Systems, devices, and methods for unified modular beam diagnostics (2024-09-10),
4. 12070625 - Systems, devices, and methods for high quality ion beam formation (2024-08-27),
5. 12057243 - Systems, devices, and methods for beam position monitoring and beam imaging (2024-08-06),
6. 12010788 - Systems, devices, and methods for initiating beam transport in a beam system (2024-06-11),
7. 11524179 - Systems, devices, and methods for high quality ion beam formation (2022-12-13),
8. 11195627 - Systems and methods for improved sustainment of a high performance FRC plasma at elevated energies utilizing neutral beam injectors with tunable beam energies (2021-12-07),

Title: Alexander Dunaevsky: Innovator in Particle Beam Technology

Introduction

Alexander Dunaevsky is a prominent inventor based in Corona, CA, known for his significant contributions to the field of particle beam technology. With a total of 8 patents to his name, Dunaevsky has made remarkable advancements that enhance the performance of neutron beam systems.

Latest Patents

Dunaevsky's latest patents include innovative systems and methods aimed at optimizing neutron beam performance. One of his notable inventions is focused on ion beam exclusion paths on the target surface. This invention involves directing a particle beam along an axis to ensure it is incident on a target positioned on that axis. The target features a scannable surface that extends over an area substantially orthogonal to the axis. The particle beam is scanned across this surface along a first path with a specific flux, while a second path within an exclusion area is also utilized. Another significant patent involves systems for ion beam modulation, where an ion source provides a negative ion beam to a tandem accelerator system. This system includes a modulator that biases the extraction electrode to maintain acceleration voltage stability.

Career Highlights

Dunaevsky is currently employed at Tae Technologies, Inc., where he continues to develop cutting-edge technologies in particle beam systems. His work has been instrumental in advancing the capabilities of neutron beam applications.

Collaborations

Throughout his career, Dunaevsky has collaborated with notable professionals in the field, including Vladislav Vekselman and Artem N Smirnov. These collaborations have further enriched his research and development efforts.

Conclusion

Alexander Dunaevsky stands out as a key figure in the realm of particle beam technology, with a strong portfolio of patents that reflect his innovative spirit and dedication to advancing scientific knowledge. His contributions continue to shape the future of neutron beam performance optimization.

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